Issued Patents 2018
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10049885 | Method for patterning a plurality of features for fin-like field-effect transistor (FinFET) devices | Hoi-Tou Ng, Ming-Feng Shieh, Ru-Gun Liu | 2018-08-14 |
| 9983473 | Photomask and method for fabricating integrated circuit | Chun Lin, Yi-Jie Chen, Feng-Yuan Chiu, Ying-Chou Cheng, Ya Hui Chang +2 more | 2018-05-29 |
| 9917192 | Structure and method for transistors with line end extension | Shao-Ming Yu, Chang-Yun Chang, Chih-Hao Chang, Hsin-Chih Chen, Kai-Tai Chang +2 more | 2018-03-13 |
| 9904163 | Cut-mask patterning process for FIN-like field effect transistor (FINFET) device | Wei-De Ho, Ching-Yu Chang, Ming-Feng Shieh | 2018-02-27 |