Issued Patents 2018
Showing 1–25 of 35 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10163648 | Method of semiconductor device fabrication having application of material with cross-linkable component | Wei-Han Lai, Chin-Hsiang Lin | 2018-12-25 |
| 10163632 | Material composition and process for substrate modification | Wei-Han Lai, Chien-Wei Wang, Chin-Hsiang Lin | 2018-12-25 |
| 10163631 | Polymer resin comprising gap filling materials and methods | Yu-Chung Su | 2018-12-25 |
| 10161877 | Optical detection system | Ming-Shu Lin, Ying-Ting Chen, Wang Chu Chen | 2018-12-25 |
| 10157739 | Orientation layer for directed self-assembly patterning process | Tsung-Han Ko, Kuan-Hsin Lo | 2018-12-18 |
| 10114291 | Grafting agent for forming spacer layer | Ya-Ling Cheng, Chien-Chih Chen, Chun-Kuang Chen, Siao-Shan Wang, Wei-Liang Lin | 2018-10-30 |
| 10115592 | Patterning process with silicon mask layer | Chen-Yu Liu, Chin-Hsiang Lin | 2018-10-30 |
| 10115585 | Hardmask composition and methods thereof | Chen-Yu Liu, Chin-Hsiang Lin | 2018-10-30 |
| 10114286 | Photoresist and method | Chen-Hau Wu, Wei-Han Lai | 2018-10-30 |
| 10096481 | Method for forming semiconductor structure | Li-Yen Lin | 2018-10-09 |
| 10095113 | Photoresist and method | Wei-Han Lai | 2018-10-09 |
| 10083832 | Under layer composition and method of manufacturing semiconductor device | Chen-Yu Liu, Chin-Hsiang Lin, Ming-Hui Weng | 2018-09-25 |
| 10082734 | Composition and method for lithography patterning | Yu-Chung Su | 2018-09-25 |
| 10073347 | Semiconductor method of protecting wafer from bevel contamination | An-Ren Zi, Joy Cheng, Chin-Hsiang Lin | 2018-09-11 |
| 10062604 | Semiconductor device and method for fabricating the same | Ssu-I Fu, Yu-Hsiang Hung, Chih-Kai Hsu, Wei-Chi Cheng, Jyh-Shyang Jenq | 2018-08-28 |
| 10056256 | Method of priming photoresist before application of a shrink material in a lithography process | Wei-Han Lai | 2018-08-21 |
| 10048590 | Method and apparatus of patterning a semiconductor device | Chien-Wei Wang, Ming-Feng Shieh | 2018-08-14 |
| 10043759 | Overlay mark | Chen Chen, Ming-Feng Shieh | 2018-08-07 |
| 10036953 | Photoresist system and method | Chen-Hau Wu | 2018-07-31 |
| 10036957 | Post development treatment method and material for shrinking critical dimension of photoresist layer | Siao-Shan Wang | 2018-07-31 |
| 10007177 | Method to define multiple layer patterns using double exposures | Ming-Huei Weng, Chun-Kuang Chen | 2018-06-26 |
| 9989850 | Photoresist system and method | Chen-Hau Wu | 2018-06-05 |
| 9978594 | Formation method of semiconductor device structure using patterning stacks | Li-Yen Lin, Kuei-Shun Chen, Chin-Hsiang Lin | 2018-05-22 |
| 9958779 | Photoresist additive for outgassing reduction and out-of-band radiation absorption | Wei-Han Lai, Chien-Wei Wang | 2018-05-01 |
| 9941157 | Porogen bonded gap filling material in semiconductor manufacturing | Bo-Jiun Lin, Hai-Ching Chen, Tien-I Bao | 2018-04-10 |