Issued Patents 2018
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10163632 | Material composition and process for substrate modification | Wei-Han Lai, Ching-Yu Chang, Chin-Hsiang Lin | 2018-12-25 |
| 10048590 | Method and apparatus of patterning a semiconductor device | Ming-Feng Shieh, Ching-Yu Chang | 2018-08-14 |
| 10042252 | Extreme ultraviolet photoresist and method | Yen-Hao Chen, Wei-Han Lai, Chin-Hsiang Lin | 2018-08-07 |
| 9983474 | Photoresist having sensitizer bonded to acid generator | Yen-Hao Chen | 2018-05-29 |
| 9958779 | Photoresist additive for outgassing reduction and out-of-band radiation absorption | Wei-Han Lai, Ching-Yu Chang | 2018-05-01 |
| 9921480 | Extreme ultraviolet photoresist | Wei-Han Lai, Ching-Yu Chang | 2018-03-20 |
| 9864275 | Lithographic resist with floating protectant | Ching-Yu Chang, Hsueh-An Chen | 2018-01-09 |