Issued Patents 2018
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10157755 | Purge and pumping structures arranged beneath substrate plane to reduce defects | Ramesh Chandrasekharan, Shankar Swaminathan | 2018-12-18 |
| 10145010 | Multi-station plasma reactor with RF balancing | Sunil Kapoor, Karl Leeser, Yaswanth Rangineni | 2018-12-04 |
| 10128160 | Systems and methods for detection of plasma instability by electrical measurement | Yukinori Sakiyama, Ishtak Karim, Yaswanth Rangineni, Ramesh Chandrasekharan, Edward Augustyniak +1 more | 2018-11-13 |
| 10100407 | Hardware and process for film uniformity improvement | Purushottam Kumar, Hu Kang, Yi Chung Chiu, Frank L. Pasquale, Jun Qian +5 more | 2018-10-16 |
| 10094018 | Dynamic precursor dosing for atomic layer deposition | Purushottam Kumar, Jun Qian, Hu Kang, Ishtak Karim, Fung Suong Ou | 2018-10-09 |
| 10074543 | High dry etch rate materials for semiconductor patterning applications | Arpan Mahorowala, Ishtak Karim, Purushottam Kumar, Shankar Swaminathan | 2018-09-11 |
| 10062563 | Selective atomic layer deposition with post-dose treatment | Purushottam Kumar, Ishtak Karim, Jun Qian, Frank L. Pasquale, Bart J. van Schravendijk | 2018-08-28 |
| 10043657 | Plasma assisted atomic layer deposition metal oxide for patterning applications | Shankar Swaminathan, Frank L. Pasquale | 2018-08-07 |
| 10037884 | Selective atomic layer deposition for gapfill using sacrificial underlayer | Fung Suong Ou, Purushottam Kumar, Ishtak Karim, Jun Qian | 2018-07-31 |
| 10008428 | Methods for depositing films on sensitive substrates | Hu Kang, Shankar Swaminathan, Jon Henri | 2018-06-26 |
| 9997422 | Systems and methods for frequency modulation of radiofrequency power supply for controlling plasma instability | Ishtak Karim, Yukinori Sakiyama, Yaswanth Rangineni, Edward Augustyniak, Douglas Keil +2 more | 2018-06-12 |
| 9997357 | Capped ALD films for doping fin-shaped channel regions of 3-D IC transistors | Reza Arghavani, Samantha Tan, Bhadri N. Varadarajan, Ananda Banerji, Jun Qian +1 more | 2018-06-12 |
| 9997371 | Atomic layer etch methods and hardware for patterning applications | Pulkit Agarwal, Purushottam Kumar | 2018-06-12 |
| 9970108 | Systems and methods for vapor delivery in a substrate processing system | Jun Qian, Hu Kang, Purushottam Kumar, Chloe Baldasseroni, Heather Landis +11 more | 2018-05-15 |
| 9966299 | Inhibitor plasma mediated atomic layer deposition for seamless feature fill | Wei Tang, Bart J. van Schravendijk, Jun Qian, Hu Kang, Deenesh Padhi +1 more | 2018-05-08 |
| 9941113 | Systems and methods for using electrical asymmetry effect to control plasma process space in semiconductor fabrication | Douglas Keil, Ishtak Karim, Yaswanth Rangineni, Yukinori Sakiyama, Edward Augustyniak +2 more | 2018-04-10 |
| 9920844 | Valve manifold deadleg elimination via reentrant flow path | Karl Leeser, Saangrut Sangplung, Shankar Swaminathan, Frank L. Pasquale, Chloe Baldasseroni +1 more | 2018-03-20 |
| 9905423 | Soft landing nanolaminates for advanced patterning | Frank L. Pasquale, Shankar Swaminathan, Nader Shamma, Girish Dixit | 2018-02-27 |
| 9899195 | Systems and methods for removing particles from a substrate processing chamber using RF plasma cycling and purging | Hu Kang | 2018-02-20 |
| 9892917 | Plasma assisted atomic layer deposition of multi-layer films for patterning applications | Shankar Swaminathan, Frank L. Pasquale | 2018-02-13 |
| 9870917 | Variable temperature hardware and methods for reduction of wafer backside deposition | Hu Kang, Ishtak Karim, Purushottam Kumar, Jun Qian, Ramesh Chandrasekharan | 2018-01-16 |