Issued Patents 2018
Showing 25 most recent of 41 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10157912 | CMOS compatible fuse or resistor using self-aligned contacts | Veeraraghavan S. Basker, Kangguo Cheng, Junli Wang | 2018-12-18 |
| 10157908 | Electrostatic discharge devices and methods of manufacture | Huiming Bu, Junjun Li, Tenko Yamashita | 2018-12-18 |
| 10157797 | FinFET devices | Veeraraghavan S. Basker, Kangguo Cheng, Junli Wang | 2018-12-18 |
| 10141402 | FinFET devices | Veeraraghavan S. Basker, Kangguo Cheng, Junli Wang | 2018-11-27 |
| 10134674 | Structure and method for improved stabilization of cobalt cap and/or cobalt liner in interconnects | Benjamin D. Briggs, James J. Kelly, Koichi Motoyama, Roger A. Quon, Michael Rizzolo | 2018-11-20 |
| 10096484 | Vertical transistor with a body contact for back-biasing | Veeraraghavan S. Basker, Kangguo Cheng, Junli Wang | 2018-10-09 |
| 10090411 | Air-gap top spacer and self-aligned metal gate for vertical fets | Veeraraghavan S. Basker, Kangguo Cheng, Junli Wang | 2018-10-02 |
| 10079232 | FinFET CMOS with silicon fin n-channel FET and silicon germanium fin p-channel FET | Veeraraghavan S. Basker, Kangguo Cheng, Junli Wang | 2018-09-18 |
| 10062785 | Fin field-effect transistor (FinFET) with reduced parasitic capacitance | Veeraraghavan S. Basker, Kangguo Cheng, Junli Wang | 2018-08-28 |
| 10062605 | Via and chamfer control for advanced interconnects | Yann Mignot, Chih-Chao Yang | 2018-08-28 |
| 10056367 | Gate stack integrated metal resistors | Veeraraghavan S. Basker, Kangguo Cheng, Junli Wang | 2018-08-21 |
| 10056489 | Replacement metal gate structures | Veeraraghavan S. Basker, Kangguo Cheng, Junli Wang | 2018-08-21 |
| 10056366 | Gate stack integrated metal resistors | Veeraraghavan S. Basker, Kangguo Cheng, Junli Wang | 2018-08-21 |
| 10050039 | Semiconductor structures with deep trench capacitor and methods of manufacture | Kevin K. Chan, Sivananda K. Kanakasabapathy, Babar A. Khan, Masaharu Kobayashi, Effendi Leobandung +1 more | 2018-08-14 |
| 10050141 | Precise control of vertical transistor gate length | Veeraraghavan S. Basker, Kangguo Cheng, Junli Wang | 2018-08-14 |
| 10050121 | Replacement metal gate structures | Veeraraghavan S. Basker, Kangguo Cheng, Junli Wang | 2018-08-14 |
| 10049920 | Reduced tip-to-tip and via pitch at line end | Brent A. Anderson, Benjamin D. Briggs | 2018-08-14 |
| 10042968 | Semiconductor structures with deep trench capacitor and methods of manufacture | Kevin K. Chan, Sivananda K. Kanakasabapathy, Babar A. Khan, Masaharu Kobayashi, Effendi Leobandung +1 more | 2018-08-07 |
| 10037916 | Semiconductor fins for finFET devices and sidewall image transfer (SIT) processes for manufacturing the same | Veeraraghavan S. Basker, Kangguo Cheng | 2018-07-31 |
| 10032711 | Integrating metal-insulator-metal capacitors with air gap process flow | Veeraraghavan S. Basker, Kangguo Cheng, Junli Wang | 2018-07-24 |
| 10032769 | Cmos compatible fuse or resistor using self-aligned contacts | Veeraraghavan S. Basker, Kangguo Cheng, Junli Wang | 2018-07-24 |
| 10020223 | Reduced tip-to-tip and via pitch at line end | Brent A. Anderson, Benjamin D. Briggs | 2018-07-10 |
| 10014221 | FinFET devices | Veeraraghavan S. Basker, Kangguo Cheng, Junli Wang | 2018-07-03 |
| 10008449 | Self-forming barrier for subtractive copper | Vamsi K. Paruchuri | 2018-06-26 |
| 10008415 | Gate structure cut after formation of epitaxial active regions | Xiuyu Cai, Kangguo Cheng, Johnathan E. Faltermeier, Ali Khakifirooz, Ruilong Xie | 2018-06-26 |