Issued Patents 2016
Showing 26–41 of 41 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9355862 | Fluorine-based hardmask removal | Mandar B. Pandit, Xikun Wang, Zhenjiang Cui, Mikhail Korolik, Anchuan Wang | 2016-05-31 |
| 9355922 | Systems and methods for internal surface conditioning in plasma processing equipment | Soonam Park, Yufei Zhu, Edwin C. Suarez, Dmitry Lubomirsky, Jiayin Huang | 2016-05-31 |
| 9355863 | Non-local plasma oxide etch | Zhijun Chen, Seung Ho Park, Mikhail Korolik, Anchuan Wang | 2016-05-31 |
| 9355856 | V trench dry etch | Xikun Wang, Anchuan Wang | 2016-05-31 |
| 9343293 | Flowable silicon—carbon—oxygen layers for semiconductor processing | Brian Saxton Underwood, Abhijit Basu Mallick | 2016-05-17 |
| 9343327 | Methods for etch of sin films | Jingchun Zhang, Anchuan Wang | 2016-05-17 |
| 9343272 | Self-aligned process | Mandar B. Pandit, Anchuan Wang | 2016-05-17 |
| 9324576 | Selective etch for silicon films | Jingchun Zhang, Anchuan Wang | 2016-04-26 |
| 9309598 | Oxide and metal removal | Xikun Wang, Jie Liu, Anchuan Wang, Jeffrey W. Anthis, Benjamin Schmiege | 2016-04-12 |
| 9299582 | Selective etch for metal-containing materials | Jessica S. Kachian, Lin Xu, Soonam Park, Xikun Wang, Jeffrey W. Anthis | 2016-03-29 |
| 9299583 | Aluminum oxide selective etch | Xikun Wang, Anchuan Wang | 2016-03-29 |
| 9287134 | Titanium oxide etch | Xikun Wang, Lin Xu, Anchuan Wang | 2016-03-15 |
| 9275834 | Selective titanium nitride etch | Seung Ho Park, Mikhail Korolik, Anchuan Wang | 2016-03-01 |
| 9263278 | Dopant etch selectivity control | Vinod R. Purayath, Anchuan Wang | 2016-02-16 |
| 9236266 | Dry-etch for silicon-and-carbon-containing films | Jingchun Zhang, Anchuan Wang, Yunyu Wang, Young S. Lee | 2016-01-12 |
| 9236265 | Silicon germanium processing | Mikhail Korolik, Anchuan Wang, Jingjing Xu | 2016-01-12 |