Issued Patents 2005
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6962644 | Tandem etch chamber plasma processing system | Alexander Paterson, Valentin Todorov, Jon McChesney, Gerhard Schneider, David Palagashvili +1 more | 2005-11-08 |
| 6939434 | Externally excited torroidal plasma source with magnetic control of ion distribution | Kenneth S. Collins, Hiroji Hanawa, Yan Ye, Kartik Ramaswamy, Andrew Nguyen +1 more | 2005-09-06 |
| 6930061 | Plasma processes for depositing low dielectric constant films | David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Kuo-Wei Liu +5 more | 2005-08-16 |
| 6893533 | Plasma reactor having a symmetric parallel conductor coil antenna | John Holland, Valentin N. Todorow | 2005-05-17 |
| 6888040 | Method and apparatus for abatement of reaction products from a vacuum processing chamber | Paul Shufflebotham | 2005-05-03 |
| 6879870 | Method and apparatus for routing harmonics in a plasma to ground within a plasma enhanced semiconductor wafer processing chamber | Steven C. Shannon, Daniel J. Hoffman, Lee LaBlanc | 2005-04-12 |
| 6869896 | Plasma processes for depositing low dielectric constant films | David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Kuo-Wei Liu +5 more | 2005-03-22 |
| 6853141 | Capacitively coupled plasma reactor with magnetic plasma control | Daniel J. Hoffman, Matthew L. Miller, Jang-Gyoo Yang, Heeyeop Chae, Tetsuya Ishikawa +1 more | 2005-02-08 |
| 6849151 | Monitoring substrate processing by detecting reflectively diffracted light | John Holland, David Mui, Wei Liu | 2005-02-01 |
| 6841006 | Atmospheric substrate processing apparatus for depositing multiple layers on a substrate | Michael S. Cox, Canfeng Lai, John Parks | 2005-01-11 |