Issued Patents 2005
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6939808 | Undoped and fluorinated amorphous carbon film as pattern mask for metal etch | Eugene Tzou, Jie Yuan | 2005-09-06 |
| 6939434 | Externally excited torroidal plasma source with magnetic control of ion distribution | Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Andrew Nguyen, Michael Barnes +1 more | 2005-09-06 |
| 6921727 | Method for modifying dielectric characteristics of dielectric layers | Kang-Lie Chiang, Mahmoud Dahimene, Xiaoye Zhao, Gerardo Delgadino, Hoiman Hung +2 more | 2005-07-26 |
| 6905968 | Process for selectively etching dielectric layers | Chang-Lin Hsieh, Jie Yuan, Hui Chen, Theodoros Panagopoulos | 2005-06-14 |
| 6897154 | Selective etching of low-k dielectrics | Terry Leung, Qiqun Zheng, Chang-Lin Hsieh, Takehiko Komatsu | 2005-05-24 |
| 6894245 | Merie plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression | Daniel J. Hoffman, Dan Katz, Douglas A. Buchberger, Jr., Xiaoye Zhao, Kang-Lie Chiang +2 more | 2005-05-17 |
| 6853141 | Capacitively coupled plasma reactor with magnetic plasma control | Daniel J. Hoffman, Matthew L. Miller, Jang-Gyoo Yang, Heeyeop Chae, Michael Barnes +1 more | 2005-02-08 |