Issued Patents 2005
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6900596 | Capacitively coupled plasma reactor with uniform radial distribution of plasma | Jang-Gyoo Yang, James D. Carducci, Douglas A. Buchberger, Jr., Matthew L. Miller, Kang-Lie Chiang +2 more | 2005-05-31 |
| 6894245 | Merie plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression | Yan Ye, Dan Katz, Douglas A. Buchberger, Jr., Xiaoye Zhao, Kang-Lie Chiang +2 more | 2005-05-17 |
| 6879870 | Method and apparatus for routing harmonics in a plasma to ground within a plasma enhanced semiconductor wafer processing chamber | Steven C. Shannon, Michael Barnes, Lee LaBlanc | 2005-04-12 |
| 6853141 | Capacitively coupled plasma reactor with magnetic plasma control | Matthew L. Miller, Jang-Gyoo Yang, Heeyeop Chae, Michael Barnes, Tetsuya Ishikawa +1 more | 2005-02-08 |
| 6838635 | Plasma reactor with overhead RF electrode tuned to the plasma | Gerald Yin | 2005-01-04 |