Issued Patents 2005
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6962644 | Tandem etch chamber plasma processing system | Alexander Paterson, Valentin Todorov, Jon McChesney, Gerhard Schneider, David Palagashvili +1 more | 2005-11-08 |
| 6893533 | Plasma reactor having a symmetric parallel conductor coil antenna | Valentin N. Todorow, Michael Barnes | 2005-05-17 |
| 6849151 | Monitoring substrate processing by detecting reflectively diffracted light | Michael Barnes, David Mui, Wei Liu | 2005-02-01 |