Issued Patents 2004
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6830649 | Apparatus and method for producing semiconductors | Akira Kagoshima, Yoshimi Torii, Tatehito Usui | 2004-12-14 |
| 6828165 | Semiconductor plasma processing apparatus with first and second processing state monitoring units | Junichi Tanaka, Hiroyuki Kitsunai, Akira Kagoshima, Daisuke Shiraishi, Shoji Ikuhara +1 more | 2004-12-07 |
| 6825617 | Semiconductor processing apparatus | Seiichiro Kanno, Ryoji Nishio, Ken Yoshioka, Saburou Kanai, Hideki Kihara | 2004-11-30 |
| 6796269 | Apparatus and method for monitoring plasma processing apparatus | Ichiro Sasaki, Toshio Masuda, Muneo Furuse | 2004-09-28 |
| 6776872 | Data processing apparatus for semiconductor processing apparatus | Junichi Tanaka, Toshio Masuda, Akira Kagoshima, Shoji Ikuhara | 2004-08-17 |
| 6771481 | Plasma processing apparatus for processing semiconductor wafer using plasma | Ryoji Nishio, Seiichiro Kanno, Akira Kagoshima | 2004-08-03 |
| 6755932 | Plasma processing system and apparatus and a sample processing method | Toshio Masuda, Tatehito Usui, Mitsuru Suehiro, Hiroshi Kanekiyo, Kazue Takahashi +1 more | 2004-06-29 |
| 6747239 | Plasma processing apparatus and method | Junichi Tanaka, Hiroyuki Kitsunai, Ryoji Nishio, Seiichiro Kanno | 2004-06-08 |
| 6745096 | Maintenance method and system for plasma processing apparatus etching and apparatus | Toshio Masuda, Shoji Ikuhara, Akira Kagoshima, Junichi Tanaka | 2004-06-01 |
| 6733618 | Disturbance-free, recipe-controlled plasma processing system and method | Akira Kagoshima, Shoji Ikuhara, Toshio Masuda, Hiroyuki Kitsunai, Junichi Tanaka +2 more | 2004-05-11 |
| 6716301 | Semiconductor manufacturing apparatus and method of processing semiconductor wafer using plasma, and wafer voltage probe | Seiichiro Kanno, Ryoji Nishio, Tsutomu Tetsuka, Junichi Tanaka, Kazuyuki Ikenaga +1 more | 2004-04-06 |
| 6706543 | Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a therefor | Junichi Tanaka, Hiroyuki Kitsunai, Akira Kagoshima, Daisuke Shiraishi, Shoji Ikuhara +1 more | 2004-03-16 |
| 6700090 | Plasma processing method and plasma processing apparatus | Tetsuo Ono, Katsumi Setoguchi | 2004-03-02 |