Issued Patents 2004
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6835665 | Etching method of hardly-etched material and semiconductor fabricating method and apparatus using the method | Nobuyuki Mise, Ken Yoshioka, Tatehito Usui | 2004-12-28 |
| 6833051 | Plasma processing apparatus and method | Hideyuki Kazumi, Tsutomu Tetsuka, Masatsugu Arai, Ken Yoshioka, Tsunehiko Tsubone +4 more | 2004-12-21 |
| 6825617 | Semiconductor processing apparatus | Seiichiro Kanno, Ken Yoshioka, Saburou Kanai, Hideki Kihara, Hideyuki Yamamoto | 2004-11-30 |
| 6771481 | Plasma processing apparatus for processing semiconductor wafer using plasma | Seiichiro Kanno, Hideyuki Yamamoto, Akira Kagoshima | 2004-08-03 |
| 6759253 | Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring units | Tatehito Usui, Tetsuo Ono, Kazue Takahashi, Nobuyuki Mise | 2004-07-06 |
| 6747239 | Plasma processing apparatus and method | Junichi Tanaka, Hiroyuki Kitsunai, Seiichiro Kanno, Hideyuki Yamamoto | 2004-06-08 |
| 6716301 | Semiconductor manufacturing apparatus and method of processing semiconductor wafer using plasma, and wafer voltage probe | Seiichiro Kanno, Tsutomu Tetsuka, Junichi Tanaka, Hideyuki Yamamoto, Kazuyuki Ikenaga +1 more | 2004-04-06 |