Issued Patents 2004
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6835665 | Etching method of hardly-etched material and semiconductor fabricating method and apparatus using the method | Nobuyuki Mise, Ken Yoshioka, Ryoji Nishio | 2004-12-28 |
| 6830649 | Apparatus and method for producing semiconductors | Akira Kagoshima, Hideyuki Yamamoto, Yoshimi Torii | 2004-12-14 |
| 6815228 | Film thickness measuring method of member to be processed using emission spectroscopy and processing method of the member using the measuring method | Takashi Fujii, Motohiko Yoshigai, Tetsunori Kaji | 2004-11-09 |
| 6797529 | Processing apparatus with measuring unit and method | Toru Otsubo | 2004-09-28 |
| 6759253 | Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring units | Tetsuo Ono, Ryoji Nishio, Kazue Takahashi, Nobuyuki Mise | 2004-07-06 |
| 6755932 | Plasma processing system and apparatus and a sample processing method | Toshio Masuda, Mitsuru Suehiro, Hiroshi Kanekiyo, Hideyuki Yamamoto, Kazue Takahashi +1 more | 2004-06-29 |
| 6750977 | Apparatus for monitoring thickness of deposited layer in reactor and dry processing method | Toru Otsubo | 2004-06-15 |
| 6716300 | Emission spectroscopic processing apparatus | Tetsunori Kaji, Shizuaki Kimura, Takashi Fujii | 2004-04-06 |