Issued Patents 2004
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6828165 | Semiconductor plasma processing apparatus with first and second processing state monitoring units | Junichi Tanaka, Hiroyuki Kitsunai, Akira Kagoshima, Daisuke Shiraishi, Hideyuki Yamamoto +1 more | 2004-12-07 |
| 6815365 | Plasma etching apparatus and plasma etching method | Kazue Takahashi, Mitsuru Suehiro, Tetsunori Kaji, Saburo Kanai | 2004-11-09 |
| 6796269 | Apparatus and method for monitoring plasma processing apparatus | Ichiro Sasaki, Muneo Furuse, Hideyuki Yamamoto | 2004-09-28 |
| 6776872 | Data processing apparatus for semiconductor processing apparatus | Junichi Tanaka, Akira Kagoshima, Shoji Ikuhara, Hideyuki Yamamoto | 2004-08-17 |
| 6755932 | Plasma processing system and apparatus and a sample processing method | Tatehito Usui, Mitsuru Suehiro, Hiroshi Kanekiyo, Hideyuki Yamamoto, Kazue Takahashi +1 more | 2004-06-29 |
| 6745096 | Maintenance method and system for plasma processing apparatus etching and apparatus | Hideyuki Yamamoto, Shoji Ikuhara, Akira Kagoshima, Junichi Tanaka | 2004-06-01 |
| 6733618 | Disturbance-free, recipe-controlled plasma processing system and method | Akira Kagoshima, Hideyuki Yamamoto, Shoji Ikuhara, Hiroyuki Kitsunai, Junichi Tanaka +2 more | 2004-05-11 |
| 6706543 | Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a therefor | Junichi Tanaka, Hiroyuki Kitsunai, Akira Kagoshima, Daisuke Shiraishi, Hideyuki Yamamoto +1 more | 2004-03-16 |
| 6677167 | Wafer processing apparatus and a wafer stage and a wafer processing method | Seiichiro Kanno, Hironobu Kawahara, Mitsuru Suehiro, Saburou Kanai | 2004-01-13 |