JT

Junichi Tanaka

HI Hitachi: 8 patents #21 of 3,771Top 1%
Pioneer: 2 patents #67 of 437Top 20%
HH Hitachi High-Technologies: 1 patents #13 of 77Top 20%
KC Kuraray Co.: 1 patents #25 of 130Top 20%
NS Nippon Sanso: 1 patents #10 of 30Top 35%
Overall (2004): #927 of 270,089Top 1%
12
Patents 2004

Issued Patents 2004

Showing 1–12 of 12 patents

Patent #TitleCo-InventorsDate
6828165 Semiconductor plasma processing apparatus with first and second processing state monitoring units Hiroyuki Kitsunai, Akira Kagoshima, Daisuke Shiraishi, Hideyuki Yamamoto, Shoji Ikuhara +1 more 2004-12-07
6798576 Lens sheet and method for producing it Atsushi Nagasawa, Takahiro Kitano, Katsuya Fujisawa, Tatsufumi Watanabe 2004-09-28
6789583 Gas supply apparatus and gas supply method Takashi Orita, Makoto Echigojima 2004-09-14
6776872 Data processing apparatus for semiconductor processing apparatus Toshio Masuda, Akira Kagoshima, Shoji Ikuhara, Hideyuki Yamamoto 2004-08-17
D493445 Speaker Takekazu Iijima, Koji Nakane 2004-07-27
D493161 Speaker Takekazu Iijima, Koji Nakane 2004-07-20
6747239 Plasma processing apparatus and method Hiroyuki Kitsunai, Ryoji Nishio, Seiichiro Kanno, Hideyuki Yamamoto 2004-06-08
6745096 Maintenance method and system for plasma processing apparatus etching and apparatus Hideyuki Yamamoto, Toshio Masuda, Shoji Ikuhara, Akira Kagoshima 2004-06-01
6743733 Process for producing a semiconductor device including etching using a multi-step etching treatment having different gas compositions in each step Hiroyuki Kitsunai, Takashi Fujii, Motohiko Yoshigai 2004-06-01
6733618 Disturbance-free, recipe-controlled plasma processing system and method Akira Kagoshima, Hideyuki Yamamoto, Shoji Ikuhara, Toshio Masuda, Hiroyuki Kitsunai +2 more 2004-05-11
6716301 Semiconductor manufacturing apparatus and method of processing semiconductor wafer using plasma, and wafer voltage probe Seiichiro Kanno, Ryoji Nishio, Tsutomu Tetsuka, Hideyuki Yamamoto, Kazuyuki Ikenaga +1 more 2004-04-06
6706543 Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a therefor Hiroyuki Kitsunai, Akira Kagoshima, Daisuke Shiraishi, Hideyuki Yamamoto, Shoji Ikuhara +1 more 2004-03-16