Issued Patents 2004
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6829056 | Monitoring dimensions of features at different locations in the processing of substrates | John D. Holland, II, Hongqing Shan, Bryan Pu, Mohit Jain, Zhifeng Sui +5 more | 2004-12-07 |
| 6818096 | Plasma reactor electrode | David Palagashvili | 2004-11-16 |
| 6734115 | Plasma processes for depositing low dielectric constant films | David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Kuo-Wei Liu +5 more | 2004-05-11 |
| 6727655 | Method and apparatus to monitor electrical states at a workpiece in a semiconductor processing chamber | Jon McChesney, Alex Paterson, Valentin N. Todorow, John Holland | 2004-04-27 |
| 6706138 | Adjustable dual frequency voltage dividing plasma reactor | John Holland, Alexander Paterson, Valentin Todorov, Farhad Moghadam | 2004-03-16 |
| 6694915 | Plasma reactor having a symmetrical parallel conductor coil antenna | John Holland, Valentin N. Todorow | 2004-02-24 |
| 6692649 | Inductively coupled plasma downstream strip module | Wenli Collison, Tuqiang Ni, Butch Berney, Wayne Vereb, Brian McMillin | 2004-02-17 |
| 6685798 | Plasma reactor having a symmetrical parallel conductor coil antenna | John Holland, Valentin N. Todorow | 2004-02-03 |