Issued Patents 2003
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6670235 | Process flow for two-step collar in DRAM preparation | Stephan Kudelka, Oliver Genz | 2003-12-30 |
| 6656798 | Gate processing method with reduced gate oxide corner and edge thinning | Oleg Gluschenkov, Mary E. Weybright | 2003-12-02 |
| 6620724 | Low resistivity deep trench fill for DRAM and EDRAM applications | Uwe Schroeder, Irene McStay, Manfred Hauf, Matthias Goldbach, Bernhard Sell +5 more | 2003-09-16 |
| 6613642 | Method for surface roughness enhancement in semiconductor capacitor manufacturing | Stephen Rahn, Irene McStay, Uwe Schroeder, Stephan Kudelka, Rajarao Jammy | 2003-09-02 |
| 6605838 | Process flow for thick isolation collar with reduced length | Jack A. Mandelman, Rama Divakaruni, Gerd Fehlauer, Stephan Kudelka, Uwe Schroeder | 2003-08-12 |
| 6605860 | Semiconductor structures and manufacturing methods | Alexander Michaelis, Stephan Kudelka, Uwe Schroeder, Raj Jammy, Ulrike Gruening | 2003-08-12 |
| 6599798 | Method of preparing buried LOCOS collar in trench DRAMS | Stephan Kudelka, Uwe Schroeder, Rolf Weis | 2003-07-29 |
| 6579766 | Dual gate oxide process without critical resist and without N2 implant | Ravikumar Ramachandran, Kilho Lee | 2003-06-17 |
| 6573137 | Single sided buried strap | Ramachandra Divakaruni, Jack A. Mandelman, Wolfgang Bergner, Gary B. Bronner, Ulrike Gruening +5 more | 2003-06-03 |
| 6559002 | Rough oxide hard mask for DT surface area enhancement for DT DRAM | Stephan Kudelka, Stephen Rahn, Irene McStay, Uwe Schroeder | 2003-05-06 |
| 6555430 | Process flow for capacitance enhancement in a DRAM trench | Michael P. Chudzik, Johnathan E. Faltermeier, Rajarao Jammy, Stephan Kudelka, Irene McStay +1 more | 2003-04-29 |
| 6544855 | Process flow for sacrificial collar with polysilicon void | Rolf Weis, Irene McStay | 2003-04-08 |
| 6537926 | Process for improving the thickness uniformity of a thin oxide layer in semiconductor wafer fabrication | Martin Schrems | 2003-03-25 |
| 6534376 | Process flow for sacrificial collar scheme with vertical nitride mask | — | 2003-03-18 |