Issued Patents All Time
Showing 26–40 of 40 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7923192 | Base material for pattern-forming material, positive resist composition and method of resist pattern formation | Daiju Shiono, Tasuku Matsumiya, Yohei Kinoshita | 2011-04-12 |
| 7901865 | Resist composition and process for formation of resist patterns | Daiju Shiono, Hideo Hada | 2011-03-08 |
| 7897319 | Positive resist composition and method of forming resist pattern | Daiju Shiono, Hideo Hada | 2011-03-01 |
| 7862981 | Compound, positive resist composition and method of forming resist pattern | Daiju Shiono, Hideo Hada | 2011-01-04 |
| 7851129 | Resist composition, resist pattern forming method and compound | Daiju Shiono, Toshiyuki Ogata, Hideo Hada | 2010-12-14 |
| 7682770 | Resist composition and method for forming resist pattern | Hideo Hada, Masaru Takeshita, Ryotaro Hayashi, Syogo Matsumaru, Hiroaki Shimizu | 2010-03-23 |
| 7673620 | Internal combustion engine with breather chamber | Hayato Maehara | 2010-03-09 |
| 7648816 | Positive resist composition, method for forming resist pattern and compound | Daiju Shiono, Hideo Hada | 2010-01-19 |
| 7541138 | Resist composition | Hideo Hada, Satoshi Fujimura, Takeshi Iwai, Mitsuru Sato, Ryoichi Takasu +6 more | 2009-06-02 |
| 7527909 | Resist composition | Hideo Hada, Satoshi Fujimura, Takeshi Iwai, Mitsuru Sato, Ryoichi Takasu +6 more | 2009-05-05 |
| 7504196 | Positive resist composition, method for resist pattern formation and compound | Daju Shiono, Hideo Hada | 2009-03-17 |
| 7501220 | Resist composition | Hideo Hada, Satoshi Fujimura, Takeshi Iwai, Mitsuru Sato, Ryoichi Takasu +6 more | 2009-03-10 |
| 7371510 | Material for forming resist protecting film for use in liquid immersion lithography process, composite film, and method for forming resist pattern | Ryoichi Takasu, Mitsuru Sato, Kazumasa Wakiya, Masaaki Yoshida, Koki Tamura | 2008-05-13 |
| 7264918 | Resist composition for liquid immersion exposure process and method of forming resist pattern therewith | Kotaro Endo, Masaaki Yoshida, Hiromitsu Tsuji, Toshiyuki Ogata, Mitsuru Sato | 2007-09-04 |
| 5738968 | Positive photoresist composition | Hiroshi Hosoda, Kousuke Doi, Satoshi Niikura, Hidekatsu Kohara, Toshimasa Nakayama | 1998-04-14 |