Issued Patents All Time
Showing 76–100 of 105 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7927066 | Reflecting device, communicating pipe, exhausting pump, exhaust system, method for cleaning the system, storage medium storing program for implementing the method, substrate processing apparatus, and particle capturing component | Takahiro Murakami, Yoshiyuki Kobayashi, Tetsuji Sato, Eiichi Sugawara, Shosuke Endoh +1 more | 2011-04-19 |
| 7913702 | Substrate cleaning method, substrate cleaning apparatus, substrate processing system, substrate cleaning program and storage medium | — | 2011-03-29 |
| 7913351 | Cleaning apparatus and cleaning method | — | 2011-03-29 |
| 7883779 | Vacuum apparatus including a particle monitoring unit, particle monitoring method and program, and window member for use in the particle monitoring | Hiroyuki Nakayama | 2011-02-08 |
| 7852476 | Particle monitor system and substrate processing apparatus | — | 2010-12-14 |
| 7837432 | Exhaust system and exhausting pump connected to a processing chamber of a substrate processing apparatus | Takahiro Murakami, Yoshiyuki Kobayashi, Tetsuji Sato | 2010-11-23 |
| 7797984 | Vacuum apparatus including a particle monitoring unit, particle monitoring method and program, and window member for use in the particle monitoring | Hiroyuki Nakayama | 2010-09-21 |
| 7780786 | Internal member of a plasma processing vessel | Kouji Mitsuhashi, Hiroyuki Nakayama, Nobuyuki Nagayama, Hiroshi Nagaike | 2010-08-24 |
| 7756599 | Substrate processing apparatus, program for performing operation and control method thereof, and computer readable storage medium storing the program | Tomoyuki Kudo, Jun Ozawa, Hiroshi Nakamura, Kazunori Kazama, Hiroyuki Nakayama +1 more | 2010-07-13 |
| 7748138 | Particle removal method for a substrate transfer mechanism and apparatus | Hiroyuki Nakayama, Kikuo Okuyama, Manabu Shimada | 2010-07-06 |
| 7733502 | Roughness evaluation method and system | Machi Moriya | 2010-06-08 |
| 7654010 | Substrate processing system, substrate processing method, and storage medium | Kazuya Nagaseki | 2010-02-02 |
| 7651586 | Particle removal apparatus and method and plasma processing apparatus | Hiroshi Nagaike | 2010-01-26 |
| 7648581 | Substrate cleaning method, substrate cleaning apparatus, substrate processing system, substrate cleaning program and storage medium | — | 2010-01-19 |
| 7628864 | Substrate cleaning apparatus and method | Hiroyuki Nakayama | 2009-12-08 |
| 7560083 | Method for removing water molecules from vacuum chamber, program for executing the method, and storage medium storing the program | Hiroyuki Nakayama, Hiroshi Nagaike | 2009-07-14 |
| 7464581 | Vacuum apparatus including a particle monitoring unit, particle monitoring method and program, and window member for use in the particle monitoring | Hiroyuki Nakayama | 2008-12-16 |
| 7458247 | Vacuum apparatus including a particle monitoring unit, particle monitoring method, and program | Hiroyuki Nakayama | 2008-12-02 |
| 7416635 | Gas supply member and plasma processing apparatus | Takahiro Murakami | 2008-08-26 |
| 7347006 | Processing apparatus and method for removing particles therefrom | Hiroshi Nagaike, Hiroyuki Nakayama, Kikuo Okuyama, Manabu Shimada | 2008-03-25 |
| 7299104 | Substrate processing apparatus and substrate transferring method | Kazuyuki Tezuka, Hiroshi Koizumi, Hiroyuki Nakayama | 2007-11-20 |
| 7245364 | Apparatus for inspecting a surface of an object to be processed | — | 2007-07-17 |
| 7045465 | Particle-removing method for a semiconductor device manufacturing apparatus | Natsuko Ito, Fumihiko Uesugi | 2006-05-16 |
| 7006682 | Apparatus for monitoring particles and method of doing the same | Fumihiko Uesugi, Natsuko Ito | 2006-02-28 |
| 6737666 | Apparatus and method for detecting an end point of a cleaning process | Natsuko Ito, Fumihiko Uesugi, Yoshinori Kato, Masaru Aomori, Shuji Moriya +1 more | 2004-05-18 |