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Nobuyuki Nagayama

TL Tokyo Electron Limited: 35 patents #99 of 5,567Top 2%
FI Fujimi Incorporated: 6 patents #29 of 216Top 15%
TC Tocalo Co.: 4 patents #8 of 105Top 8%
NC Nippon Tungsten Co.: 2 patents #24 of 139Top 20%
SC Sumitomo Osaka Cement Co.: 1 patents #199 of 327Top 65%
📍 Rifu, JP: #77 of 2,101 inventorsTop 4%
Overall (All Time): #92,136 of 4,157,543Top 3%
36
Patents All Time

Issued Patents All Time

Showing 26–36 of 36 patents

Patent #TitleCo-InventorsDate
8221579 Method of reusing a consumable part for use in a plasma processing apparatus Naoyuki Satoh, Keiichi Nagakubo, Kazuya Nagaseki 2012-07-17
7892361 In-chamber member, a cleaning method therefor and a plasma processing apparatus Kouji Mitsuhashi, Hiroyuki Nakayama 2011-02-22
7780786 Internal member of a plasma processing vessel Kouji Mitsuhashi, Hiroyuki Nakayama, Tsuyoshi Moriya, Hiroshi Nagaike 2010-08-24
7646581 Electrostatic chuck Yasuharu Sasaki, Takehiro Ueda, Yusuke Nakagawa, Taketoshi Okajo, Mamoru Kosakai 2010-01-12
7481903 Processing device and method of maintaining the device, mechanism and method for assembling processing device parts, and lock mechanism and method for locking the lock mechanism Shigeru Senzaki, Toshiki Sasaki, Tadashi Aoto, Kouji Mitsuhashi 2009-01-27
7364798 Internal member for plasma-treating vessel and method of producing the same Yoshio Harada, Junichi Takeuchi, Kouji Mitsuhashi 2008-04-29
6899786 Processing device and method of maintaining the device, mechanism and method for assembling processing device part, and lock mechanism and method for locking the lock mechanism Shigeru Senzaki, Toshiki Sasaki, Tadashi Aoto, Kouji Mitsuhashi 2005-05-31
6884516 Internal member for plasma-treating vessel and method of producing the same Yoshio Harada, Junichi Takeuchi, Tatsuya Hamaguchi, Kouji Mitsuhashi 2005-04-26
6805135 Cleaning fluid and cleaning method for component of semiconductor-treating apparatus Kenichi Hirota, Hitoshi Yamada, Kiyoshi Yuasa, Eiji Yamaguchi, Shinichi Kawaguchi +1 more 2004-10-19
6790289 Method of cleaning a plasma processing apparatus Taira Takase, Kouji Mitsuhashi, Hiroyuki Nakayama 2004-09-14
6783863 Plasma processing container internal member and production method thereof Yoshio Harada, Junichi Takeuchi, Tatsuya Hamaguchi, Kouji Mitsuhashi 2004-08-31