Issued Patents All Time
Showing 26–50 of 76 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11960201 | Method of critical dimension control by oxygen and nitrogen plasma treatment in EUV mask | Chun-Fu Yang, Ta-Cheng Lien, Hsin-Chang Lee | 2024-04-16 |
| 11906897 | Method for extreme ultraviolet lithography mask treatment | Yih-Chen Su, Chi-Kuang Tsai, Ta-Cheng Lien, Tzu Yi Wang, Jong-Yuh Chang +1 more | 2024-02-20 |
| 11868041 | Pellicle and method of using the same | Chue-San Yoo, Hsin-Chang Lee, Yun-Yue Lin | 2024-01-09 |
| 11852966 | Lithography mask with a black border regions and method of fabricating the same | Chin-Hsiang Lin, Chien-Cheng Chen, Hsin-Chang Lee, Chia-Jen Chen, Yih-Chen Su +2 more | 2023-12-26 |
| 11852965 | Extreme ultraviolet mask with tantalum base alloy absorber | Ta-Cheng Lien, Hsin-Chang Lee | 2023-12-26 |
| 11852969 | Cleaning method for photo masks and apparatus therefor | Hsin-Chang Lee, Hao-Ping Cheng, Ta-Cheng Lien | 2023-12-26 |
| 11829062 | EUV photo masks and manufacturing method thereof | Ta-Cheng Lien, Hsin-Chang Lee | 2023-11-28 |
| 11815804 | EUV mask blank and method of making EUV mask blank | Ping-Hsun Lin, Ching-Fang Yu, Ta-Cheng Lien, Chia-Jen Chen, Hsin-Chang Lee | 2023-11-14 |
| 11789356 | Method of manufacturing EUV photo masks | Hsin-Chang Lee, Ta-Cheng Lien, Tzu Yi Wang | 2023-10-17 |
| 11726399 | EUV photo masks and manufacturing method thereof | Ching-Huang Chen, Hung-Yi Tsai, Ming-Wei Chen, Ta-Cheng Lien, Hsin-Chang Lee | 2023-08-15 |
| 11714350 | Method of fabricating and servicing a photomask | Chun-Fu Yang, Ta-Cheng Lien, Hsin-Chang Lee | 2023-08-01 |
| 11650493 | Method of critical dimension control by oxygen and nitrogen plasma treatment in EUV mask | Chun-Fu Yang, Ta-Cheng Lien, Hsin-Chang Lee | 2023-05-16 |
| 11630386 | Reflective mask and fabricating method thereof | Tsiao-Chen Wu | 2023-04-18 |
| 11619875 | EUV photo masks and manufacturing method thereof | Hsin-Chang Lee, Chia-Jen Chen, Ta-Cheng Lien | 2023-04-04 |
| 11561464 | EUV masks to prevent carbon contamination | Ta-Cheng Lien, Hsin-Chang Lee | 2023-01-24 |
| 11531262 | Mask blanks and methods for depositing layers on mask blank | Hsin-Chang Lee, Ta-Cheng Lien, Wen-Chang Hsueh | 2022-12-20 |
| 11506971 | Pellicle and method of using the same | Chue-San Yoo, Hsin-Chang Lee, Yun-Yue Lin | 2022-11-22 |
| 11506969 | EUV photo masks and manufacturing method thereof | Ta-Cheng Lien, Hsin-Chang Lee | 2022-11-22 |
| 11442356 | Lithography mask with an amorphous capping layer | Hsin-Chang Lee, Chih-Tao Chien, Ming-Wei Chen, Ta-Cheng Lien | 2022-09-13 |
| 11385538 | Cleaning method for photo masks and apparatus therefor | Hsin-Chang Lee, Hao-Ping Cheng, Ta-Cheng Lien | 2022-07-12 |
| 11360384 | Method of fabricating and servicing a photomask | Chun-Fu Yang, Ta-Cheng Lien, Hsin-Chang Lee | 2022-06-14 |
| 11249384 | Mask for EUV lithography and method of manufacturing the same | Chi-Ping Wen, Tzu Yi Wang, Ta-Cheng Lien, Hsin-Chang Lee | 2022-02-15 |
| 11243461 | Reflective mask and fabricating method thereof | Tsiao-Chen Wu | 2022-02-08 |
| 11237477 | Reticle container | Ta-Cheng Lien, Tzu Yi Wang, Hsin-Chang Lee | 2022-02-01 |
| 11221554 | EUV masks to prevent carbon contamination | Ta-Cheng Lien, Hsin-Chang Lee | 2022-01-11 |