Issued Patents All Time
Showing 51–75 of 117 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9502261 | Spacer etching process for integrated circuit design | Ru-Gun Liu, Cheng-Hsiung Tsai, Chung-Ju Lee, Chih-Ming Lai, Chia-Ying Lee +6 more | 2016-11-22 |
| 9466486 | Method for integrated circuit patterning | Ru-Gun Liu, Hung-Chang Hsieh, Tien-I Bao, Chung-Ju Lee, Shau-Lin Shue | 2016-10-11 |
| 9443768 | Method of making a FinFET device | Hung-Chang Hsieh, Han-Wei Wu | 2016-09-13 |
| 9437497 | Method of making a FinFET device | Weng-Hung Tseng, Tzung-Hua Lin, Hung-Chang Hsieh | 2016-09-06 |
| 9437415 | Layer alignment in FinFET fabrication | Kuei-Liang Lu | 2016-09-06 |
| 9368594 | Method of forming a fin-like BJT | Chih-Sheng Chang, Yi-Tang Lin | 2016-06-14 |
| 9362132 | Systems and methods for a sequential spacer scheme | Shih-Ming Chang, Ru-Gun Liu, Tsai-Sheng Gau | 2016-06-07 |
| 9362169 | Self-aligned semiconductor fabrication with fosse features | Shih-Ming Chang, Ken-Hsien Hsieh, Chih-Ming Lai, Ru-Gun Liu, Tsai-Sheng Gau | 2016-06-07 |
| 9356021 | Self-alignment for two or more layers and methods of forming same | Shih-Ming Chang, Ru-Gun Liu, Ken-Hsien Hsieh, Chih-Ming Lai, Tsai-Sheng Gau | 2016-05-31 |
| 9337083 | Multi-layer metal contacts | Wen-Hung Tseng, Chih-Ming Lai, Ken-Hsien Hsieh, Tsai-Sheng Gau, Ru-Gun Liu | 2016-05-10 |
| 9324866 | Structure and method for transistor with line end extension | Shao-Ming Yu, Chang-Yun Chang, Chih-Hao Chang, Hsin-Chih Chen, Kai-Tai Chang +2 more | 2016-04-26 |
| 9305841 | Method of patterning a feature of a semiconductor device | Yen-Chun Huang, Ken-Hsien Hsieh, Chih-Ming Lai, Ru-Gun Liu, Tsai-Sheng Gau | 2016-04-05 |
| 9287125 | Multiple edge enabled patterning | Ya Hui Chang, Ru-Gun Liu, Tsong-Hua Ou, Ken-Hsien Hsieh, Burn Jeng Lin | 2016-03-15 |
| 9281193 | Patterning method for semiconductor device fabrication | Yen-Chun Huang, Chih-Ming Lai, Ken-Hsien Hsieh | 2016-03-08 |
| 9252021 | Method for patterning a plurality of features for Fin-like field-effect transistor (FinFET) devices | Hoi-Tou Ng, Kuei-Liang Lu, Ru-Gun Liu | 2016-02-02 |
| 9245763 | Mechanisms for forming patterns using multiple lithography processes | Shih-Ming Chang, Chih-Ming Lai, Ru-Gun Liu, Tsai-Sheng Gau | 2016-01-26 |
| 9236267 | Cut-mask patterning process for fin-like field effect transistor (FinFET) device | Ho Wei De, Kuei-Liang Lu, Ching-Yu Chang | 2016-01-12 |
| 9214356 | Mechanisms for forming patterns | Ru-Gun Liu, Chung-Te Lin, Shih-Ming Chang, Tsai-Sheng Gau | 2015-12-15 |
| 9190261 | Layer alignment in FinFET fabrication | Kuei-Liang Lu | 2015-11-17 |
| 9177797 | Lithography using high selectivity spacers for pitch reduction | Yu-Sheng Chang, Chung-Ju Lee, Cheng-Hsiung Tsai, Yung-Hsu Wu, Hsiang-Huan Lee +5 more | 2015-11-03 |
| 9153478 | Spacer etching process for integrated circuit design | Ru-Gun Liu, Shih-Ming Chang, Ken-Hsien Hsieh, Chih-Ming Lai, Tsai-Sheng Gau +6 more | 2015-10-06 |
| 9153483 | Method of semiconductor integrated circuit fabrication | Wen-Hung Tseng, Hung-Chang Hsieh | 2015-10-06 |
| 9152046 | Photo-resist with floating acid | Ching-Yu Chang, Wen-Hung Tseng | 2015-10-06 |
| 9136106 | Method for integrated circuit patterning | Chieh-Han Wu, Chung-Ju Lee, Cheng-Hsiung Tsai, Ru-Gun Liu, Tien-I Bao +1 more | 2015-09-15 |
| 9129839 | Method of fabricating a FinFET device | Chen Chen | 2015-09-08 |