Issued Patents All Time
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9037279 | Clustering for prediction models in process control and for optimal dispatching | Tzu-Yu Wang, Kewei Zuo, Henry Lo, Jean Wang, Chih-Wei Lai | 2015-05-19 |
| 8716867 | Forming interconnect structures using pre-ink-printed sheets | Chi-Chun Hsieh, Shang-Yun Hou, Wen-Chih Chiou, Shin-Puu Jeng, Chen-Hua Yu | 2014-05-06 |
| 8682466 | Automatic virtual metrology for semiconductor wafer result prediction | Chih-Wei Lai, Kewei Zuo, Henry Lo, Jean Wang, Ping-Hsu Chen +2 more | 2014-03-25 |
| 8433434 | Near non-adaptive virtual metrology and chamber control | Amy Wang, Chen-Hua Yu, Jean Wang, Henry Lo, Chih-Wei Lai +1 more | 2013-04-30 |
| 8409993 | Method and system for controlling copper chemical mechanical polish uniformity | Chun-Hsien Lin, Jean Wang, Chih-Wei Lai, Ping-Hsu Chen, Henry Lo | 2013-04-02 |
| 8145337 | Methodology to enable wafer result prediction of semiconductor wafer batch processing equipment | Chun-Hsien Lin, Amy Wang, Jean Wang | 2012-03-27 |
| 7974728 | System for extraction of key process parameters from fault detection classification to enable wafer prediction | Chun-Hsien Lin, Kewei Zuo, Henry Lo, Jean Wang | 2011-07-05 |
| 7851234 | System and method for enhanced control of copper trench sheet resistance uniformity | Jean Wang, Henry Lo, Chi-Chun Hsieh, Amy Wang | 2010-12-14 |
| 7767471 | Auto routing for optimal uniformity control | Jean Wang, Henry Lo, Chi-Chun Hsieh, Amy Wang, Chih-Wei Lai +1 more | 2010-08-03 |
| 7642100 | Method and system for yield and productivity improvements in semiconductor processing | Chen-Hua Yu, Lawrance Sheu, Yi-Li Hsiao | 2010-01-05 |
| 7634325 | Prediction of uniformity of a wafer | Jean Wang, Ping-Hsu Chen, Henry Lo, Chih-Wei Lai | 2009-12-15 |
| 7160671 | Method for argon plasma induced ultraviolet light curing step for increasing silicon-containing photoresist selectivity | Richard Chen, Charlie Lee | 2007-01-09 |
| 7144297 | Method and apparatus to enable accurate wafer prediction | Chun-Hsien Lin, Ping-Hsu Chen, Sunny Wu | 2006-12-05 |
| 6799907 | Plasma enhanced method for increasing silicon-containing photoresist selectivity | Sandy Chen, Charlie Lee | 2004-10-05 |
| 6559049 | All dual damascene oxide etch process steps in one confined plasma chamber | Lawrence Shao-hsien Chen, Chang-Tai Chiao, Young-Tong Tsai, Chuan-Kai Lo | 2003-05-06 |
| 6541361 | Plasma enhanced method for increasing silicon-containing photoresist selectivity | Sandy Chen, Charlie Lee | 2003-04-01 |