Issued Patents All Time
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6861362 | Self-aligned contact process implementing bias compensation etch endpoint detection and methods for implementing the same | Jun-Cheng Ko | 2005-03-01 |
| 6559049 | All dual damascene oxide etch process steps in one confined plasma chamber | Lawrence Shao-hsien Chen, Chang-Tai Chiao, Francis Ko, Chuan-Kai Lo | 2003-05-06 |
| 6274500 | Single wafer in-situ dry clean and seasoning for plasma etching process | Dai Xuechun, Liang-Hsin Chen, Aik Kwang Ng | 2001-08-14 |
| 6057240 | Aqueous surfactant solution method for stripping metal plasma etch deposited oxidized metal impregnated polymer residue layers from patterned metal layers | Mei Sheng Zhou, Jian Ye, Simon Chooi | 2000-05-02 |
| 5792708 | Method for forming residue free patterned polysilicon layers upon high step height integrated circuit substrates | Mei Sheng Zhou, Lap Chan | 1998-08-11 |