Issued Patents All Time
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6559049 | All dual damascene oxide etch process steps in one confined plasma chamber | Lawrence Shao-hsien Chen, Chang-Tai Chiao, Young-Tong Tsai, Francis Ko | 2003-05-06 |
| 6486070 | Ultra-high oxide to photoresist selective etch of high-aspect-ratio openings in a low-pressure, high-density plasma | Chok W. Ho, Fang-Ju Lin | 2002-11-26 |