Issued Patents All Time
Showing 26–45 of 45 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7977772 | Hybrid metal fully silicided (FUSI) gate | Chen-Hua Yu, Cheng-Tung Lin, Cheng-Hung Chang, Hsiang-Yi Wang | 2011-07-12 |
| 7939889 | Reducing resistance in source and drain regions of FinFETs | Chen-Hua Yu, Yu-Rung Hsu, Cheng-Hung Chang | 2011-05-10 |
| 7910994 | System and method for source/drain contact processing | Chen-Hua Yu, Cheng-Hung Chang, Yu-Rung Hsu | 2011-03-22 |
| 7902035 | Semiconductor device having multiple fin heights | Chen-Hua Yu, Yu-Rung Hsu | 2011-03-08 |
| 7892909 | Polysilicon gate formation by in-situ doping | Chen-Hua Yu, Ding-Yuan Chen, Chu-Yun Fu, Liang-Gi Yao | 2011-02-22 |
| 7880303 | Stacked contact with low aspect ratio | Chen-Hua Yu, Chih-Hsiang Yao, Wen-Kai Wan, Jye-Yen Cheng | 2011-02-01 |
| 7843000 | Semiconductor device having multiple fin heights | Chen-Hua Yu, Yu-Rung Hsu | 2010-11-30 |
| 7745890 | Hybrid metal fully silicided (FUSI) gate | Chen-Hua Yu, Cheng-Tung Lin, Cheng-Hung Chang, Hsiang-Yi Wang | 2010-06-29 |
| 7667271 | Fin field-effect transistors | Chen-Hua Yu, Yu-Rung Hsu | 2010-02-23 |
| 7629655 | Semiconductor device with multiple silicide regions | Chen-Hua Yu, Cheng-Tung Lin | 2009-12-08 |
| 7612405 | Fabrication of FinFETs with multiple fin heights | Chen-Hua Yu, Chu-Yun Fu, Yu-Rung Hsu | 2009-11-03 |
| 7560785 | Semiconductor device having multiple fin heights | Chen-Hua Yu, Yu-Rung Hsu | 2009-07-14 |
| 7538025 | Dual damascene process flow for porous low-k materials | Chao-Cheng Chen, Chien-Chung Fu | 2009-05-26 |
| 7510940 | Method for fabricating dual-gate semiconductor device | Mong-Song Liang, Ryan Chia-Jen Chen, Yuan-Hung Chiu | 2009-03-31 |
| 7341943 | Post etch copper cleaning using dry plasma | Miao-Ju Hsu, Hun-Jan Tao | 2008-03-11 |
| 7169701 | Dual damascene trench formation to avoid low-K dielectric damage | Tsiao-Chen Wu, Chao-Cheng Chen | 2007-01-30 |
| 7094683 | Dual damascene method for ultra low K dielectrics | Yung-Cheng Lu | 2006-08-22 |
| 7029992 | Low oxygen content photoresist stripping process for low dielectric constant materials | Jyu-Horng Shieh, Yi-Nien Su, Jang-Shiang Tsai, Hun-Jan Tao | 2006-04-18 |
| 6797630 | Partial via hard mask open on low-k dual damascene etch with dual hard mask (DHM) approach | Tsang-Jiuh Wu, Li-Te Lin, Li-Chih Chao | 2004-09-28 |
| 6616855 | Process to reduce surface roughness of low K damascene | Chao-Cheng Chen | 2003-09-09 |