RS

Reinhard Stengl

SA Siemens Aktiengesellschaft: 45 patents #51 of 22,248Top 1%
Infineon Technologies Ag: 23 patents #305 of 7,486Top 5%
IBM: 10 patents #10,888 of 70,183Top 20%
KT Kabushiki Kaisha Toshiba: 2 patents #9,982 of 21,451Top 50%
DU Duke University: 1 patents #1,064 of 2,315Top 50%
📍 Munich, NC: #1 of 6 inventorsTop 20%
Overall (All Time): #30,374 of 4,157,543Top 1%
69
Patents All Time

Issued Patents All Time

Showing 26–50 of 69 patents

Patent #TitleCo-InventorsDate
6215140 Electrically programmable non-volatile memory cell configuration Hans Reisinger, Martin Franosch, Herbert Schafer, Volker Lehmann, Gerrit Lange +1 more 2001-04-10
6204119 Manufacturing method for a capacitor in an integrated memory circuit Gerrit Lange, Martin Franosch, Wolfgang Hönlein, Volker Lehmann, Hans Reisinger +2 more 2001-03-20
6197666 Method for the fabrication of a doped silicon layer Herbert Schafer, Martin Franosch, Hans Reisinger, Matthias Ilg 2001-03-06
6194765 Integrated electrical circuit having at least one memory cell and method for fabricating it Hans Reisinger, Ulrike Gruning, Volker Lehmann, Hermann Wendt, Josef Willer +2 more 2001-02-27
6165835 Method for producing a silicon capacitor Hermann Wendt, Hans Reisinger, Andreas Spitzer, Ulrike Gruning, Josef Willer +2 more 2000-12-26
6140177 Process of forming a semiconductor capacitor including forming a hemispherical grain statistical mask with silicon and germanium Herbert Schafer, Martin Franosch, Volker Lehmann, Hans Reisinger, Hermann Wendt 2000-10-31
6133126 Method for fabricating a dopant region Hans Reisinger, Martin Franosch, Herbert Schafer, Volker Lehmann, Gerrit Lange +1 more 2000-10-17
6127220 Manufacturing method for a capacitor in an integrated storage circuit Gerrit Lange, Martin Franosch, Volker Lehmann, Hans Reisinger, Herbert Schafer +1 more 2000-10-03
6117790 Method for fabricating a capacitor for a semiconductor memory configuration Herbert Schafer, Martin Franosch, Gerrit Lange, Hans Reisinger, Hermann Wendt +1 more 2000-09-12
6054345 Method for forming deep depletion mode dynamic random access memory (DRAM) cell Johann Alsmeier 2000-04-25
6040995 Method of operating a storage cell arrangement Hans Reisinger, Ulrike Gruning, Hermann Wendt, Volker Lehmann, Josef Willer +5 more 2000-03-21
6037209 Method for producing a DRAM cellular arrangement Wolfgang Rosner, Lothar Risch, Franz Hofmann 2000-03-14
6022786 Method for manufacturing a capacitor for a semiconductor arrangement Martin Franosch, Wolfgang Hoenlein, Helmut Klose, Gerrit Lange, Volker Lehmann +4 more 2000-02-08
6018174 Bottle-shaped trench capacitor with epi buried layer Martin Schrems, Jack A. Mandelman, Joachim Hoepfner, Herbert Schaefer 2000-01-25
5994746 Memory cell configuration and method for its fabrication Hans Reisinger, Franz Hofmann, Wolfgang Krautschneider, Josef Willer 1999-11-30
5973385 Method for suppressing pattern distortion associated with BPSG reflow and integrated circuit chip formed thereby Jeffrey P. Gambino, Son V. Nguyen 1999-10-26
5960318 Borderless contact etch process with sidewall spacer and selective isotropic etch process Matthias Peschke, Jeffrey P. Gambino, James G. Ryan 1999-09-28
5945704 Trench capacitor with epi buried layer Martin Schrems, Jack A. Mandelman, Joachim Hoepfner, Herbert Schaefer 1999-08-31
5943571 Method for manufacturing fine structures Herbert Schaefer, Martin Franosch, Volker Lehmann, Hans Reisinger, Hermann Wendt 1999-08-24
5893735 Three-dimensional device layout with sub-groundrule features Erwin Hammerl, Jack A. Mandelman, Herbert L. Ho, Radhika Srinivasan, Alvin P. Short +1 more 1999-04-13
5844266 Buried strap formation in a DRAM trench capacitor Erwin Hammerl, Herbert L. Ho, Jack A. Mandelman, Radhika Srinivasan, Alvin P. Short 1998-12-01
5827765 Buried-strap formation in a dram trench capacitor Erwin Hammerl, Herbert L. Ho, Jack A. Mandelman, Radhika Srinivasan, Alvin P. Short 1998-10-27
5817553 Process for manufacturing capacitors in a solid state configuration Martin Franosch, Hermann Wendt 1998-10-06
5804499 Prevention of abnormal WSi.sub.x oxidation by in-situ amorphous silicon deposition Christine Dehm, Hans-Joerg Timme 1998-09-08
5792685 Three-dimensional device layout having a trench capacitor Erwin Hammerl, Jack A. Mandelman, Bernhard Poschenrieder, Alvin P. Short, Radhika Srinivasan +1 more 1998-08-11