Issued Patents All Time
Showing 26–50 of 52 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8941812 | Exposure method, exposure apparatus, and device manufacturing method | Kenichi Shiraishi | 2015-01-27 |
| 8922754 | Immersion exposure apparatus and device fabricating method with two substrate stages and metrology station | Yuichi Shibazaki | 2014-12-30 |
| 8891055 | Maintenance method, maintenance device, exposure apparatus, and device manufacturing method | Yasufumi Nishii, Kenichi Shiraishi | 2014-11-18 |
| 8795953 | Pattern forming method and method for producing device | Toshikazu Umatate, Soichi Owa | 2014-08-05 |
| 8724077 | Exposure apparatus, exposure method, and device manufacturing method | Hiroyuki Nagasaka, Kenichi Shiraishi, Soichi Owa, Akihiro Miwa | 2014-05-13 |
| 8654308 | Method for determining exposure condition, exposure method, exposure apparatus, and method for manufacturing device | — | 2014-02-18 |
| 8456608 | Maintenance method, maintenance device, exposure apparatus, and device manufacturing method | Yasufumi Nishii, Kenichi Shiraishi | 2013-06-04 |
| 8330939 | Immersion exposure apparatus and device manufacturing method with a liquid recovery port provided on at least one of a first stage and second stage | Yuichi Shibazaki | 2012-12-11 |
| 8236467 | Exposure method, exposure apparatus, and device manufacturing method | Kenichi Shiraishi | 2012-08-07 |
| 8179517 | Exposure apparatus and method, maintenance method for exposure apparatus, and device manufacturing method | — | 2012-05-15 |
| 8089608 | Exposure apparatus, exposure method, and device manufacturing method | Hiroyuki Nagasaka, Kenichi Shiraishi, Soichi Owa, Akihiro Miwa | 2012-01-03 |
| 8064039 | Exposure method, exposure apparatus, and device manufacturing method | Kenichi Shiraishi, Ryuichi Hoshika | 2011-11-22 |
| 8040489 | Substrate processing method, exposure apparatus, and method for producing device by immersing substrate in second liquid before immersion exposure through first liquid | Katsushi Nakano, Masahiko Okumura, Tarou Sugihara, Takeyuki Mizutani | 2011-10-18 |
| 8018571 | Exposure apparatus and exposure method, and device manufacturing method | — | 2011-09-13 |
| 7914972 | Exposure method and device manufacturing method | Hiroyuki Nagasaka | 2011-03-29 |
| 7804576 | Maintenance method, maintenance device, exposure apparatus, and device manufacturing method | Yasufumi Nishii, Kenichi Shiraishi | 2010-09-28 |
| 7705968 | Plate member, substrate holding device, exposure apparatus and method, and device manufacturing method | Hiroyuki Nagasaka | 2010-04-27 |
| 6936831 | Divided reticles for charged-particle-beam microlithography apparatus, and methods for using same | Noriyuki Hirayanagi, Kazuaki Suzuki, Teruaki Okino | 2005-08-30 |
| 6917048 | Methods and devices for controlling blur resulting from the space-charge effect and geometrical aberration in a charged-particle-beam microlithography apparatus | Kazuaki Suzuki | 2005-07-12 |
| 6656663 | Microlithographic exposure methods using a segmented reticle defining pattern elements exhibiting reduced incidence of stitching anomalies when imaged on a substrate | — | 2003-12-02 |
| 6632722 | Fiducial mark bodies for charged-particle-beam (CPB) microlithography, methods for making same, and CPB microlithography apparatus comprising same | Noriyuki Hirayanagi | 2003-10-14 |
| 6570752 | Wafer chucks and the like including substrate-adhesion detection and adhesion correction | Kenji Morita | 2003-05-27 |
| 6541779 | Charged-particle-beam microlithography apparatus including selectable systems for determining alignment-mark position, and device-fabrication methods utilizing same | — | 2003-04-01 |
| 6496350 | Electrostatic wafer chucks and charged-particle-beam exposure apparatus comprising same | — | 2002-12-17 |
| 6447964 | Charged-particle-beam microlithography methods including chip-exposure sequences for reducing thermally induced lateral shift of exposure position on the substrate | Teruaki Okino, Noriyuki Hirayanagi | 2002-09-10 |