Issued Patents All Time
Showing 1–25 of 37 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6936831 | Divided reticles for charged-particle-beam microlithography apparatus, and methods for using same | Tomoharu Fujiwara, Noriyuki Hirayanagi, Kazuaki Suzuki | 2005-08-30 |
| 6894291 | Apparatus and methods for blocking highly scattered charged particles in a patterned beam in a charged-particle-beam microlithography system | Shintaro Kawata | 2005-05-17 |
| 6815693 | Charged-particle-beam microlithography apparatus and methods including proximity-effect correction | Koichi Kamijo, Kazuya Okamoto | 2004-11-09 |
| 6680481 | Mark-detection methods and charged-particle-beam microlithography methods and apparatus comprising same | — | 2004-01-20 |
| 6664551 | Methods for detecting incidence orthogonality of a patterned beam in charged-particle-beam (CPB) microlithography, and CPB microlithography systems that perform same | — | 2003-12-16 |
| 6657207 | Charged-particle-beam microlithography apparatus and methods including optical corrections made during subfield exposures | Shintaro Kawata, Kazuaki Suzuki, Noriyuki Hirayanagi | 2003-12-02 |
| 6541169 | Methods for charged-particle-beam microlithography including correction of deflection aberrations, and device-manufacturing methods comprising same | Shinichi Kojima | 2003-04-01 |
| 6447964 | Charged-particle-beam microlithography methods including chip-exposure sequences for reducing thermally induced lateral shift of exposure position on the substrate | Tomoharu Fujiwara, Noriyuki Hirayanagi | 2002-09-10 |
| 6376137 | Charged-particle-beam microlithography apparatus and methods including correction of stage-positioning errors using a deflector | — | 2002-04-23 |
| 6362489 | Charged-particle-beam microlithography methods exhibiting reduced thermal deformation of mark-defining member | — | 2002-03-26 |
| 6307209 | Pattern-transfer method and apparatus | Mamoru Nakasuji | 2001-10-23 |
| 6277542 | Charged-particle-beam projection-exposure methods exhibiting more uniform beam-current density | Shintaro Kawata | 2001-08-21 |
| 6258511 | Charged particle beam exposure method utilizing partial exposure stitch area | — | 2001-07-10 |
| 6207962 | Charged-particle-beam microlithography apparatus and methods exhibiting reduced thermal deformation of mark-defining member | — | 2001-03-27 |
| 6194732 | Charged-particle-beam exposure methods with beam parallelism detection and correction | — | 2001-02-27 |
| 6162581 | Charged particle beam pattern-transfer method utilizing non-uniform dose distribution in stitching region | Mamoru Nakasuji | 2000-12-19 |
| 6151101 | Charged-particle-beam projection-exposure apparatus and methods exhibiting increased throughtput | — | 2000-11-21 |
| 6072184 | Charged-particle-beam projection methods | Shohei Suzuki | 2000-06-06 |
| 6027843 | Charged-particle-beam microlithography methods including correction of imaging faults | Shinichi Kojima | 2000-02-22 |
| 5989753 | Method, apparatus, and mask for pattern projection using a beam of charged particles | — | 1999-11-23 |
| 5981947 | Apparatus for detecting or collecting secondary electrons, charged-particle beam exposure apparatus comprising same, and related methods | Mamoru Nakasuji, Noriyuki Hirayanagi | 1999-11-09 |
| 5973333 | Charged-particle-beam pattern-transfer apparatus and methods | Mamoru Nakasuji | 1999-10-26 |
| 5933217 | Electron-beam projection-microlithography apparatus and methods | Mamoru Nakasuji | 1999-08-03 |
| 5929457 | Charged particle beam transfer apparatus | — | 1999-07-27 |
| 5914493 | Charged-particle-beam exposure apparatus and methods with substrate-temperature control | Kenji Morita | 1999-06-22 |