Issued Patents All Time
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6894291 | Apparatus and methods for blocking highly scattered charged particles in a patterned beam in a charged-particle-beam microlithography system | Teruaki Okino | 2005-05-17 |
| 6830852 | Stencil reticles for use in charged-particle-beam microlithography, and pattern-determination methods for such reticles | Koichi Kamijo, Shinichi Takahashi | 2004-12-14 |
| 6767691 | Scattering-reticle assemblies for electron-beam microlithography including a scattering-stencil reticle portion and a scattering-membrane reticle portion | — | 2004-07-27 |
| 6657207 | Charged-particle-beam microlithography apparatus and methods including optical corrections made during subfield exposures | Teruaki Okino, Kazuaki Suzuki, Noriyuki Hirayanagi | 2003-12-02 |
| 6620558 | Scattering-reticle assemblies for electron-beam microlithography including a scattering-stencil reticle portion and a scattering-membrane reticle portion | — | 2003-09-16 |
| 6403268 | Reticles for charged-particle beam microlithography | — | 2002-06-11 |
| 6403971 | Beam-adjustment methods and apparatus for charged-particle-beam microlithography | — | 2002-06-11 |
| 6277542 | Charged-particle-beam projection-exposure methods exhibiting more uniform beam-current density | Teruaki Okino | 2001-08-21 |
| 6140021 | Charged particle beam transfer method | Mamoru Nakasuji | 2000-10-31 |
| 6124718 | Charged-particle-beam projection-exposure apparatus with integrated reticle and substrate inspection | — | 2000-09-26 |
| 6087667 | Charged-particle-beam (CPB) lithography apparatus, evaluation method, and CPB source | Mamoru Nakasuji | 2000-07-11 |
| 6038015 | Electron-beam-projection-exposure apparatus with integrated mask inspection and cleaning portions | — | 2000-03-14 |
| 5969362 | High-throughput direct-write electron-beam exposure system and method | Kazuya Okamoto | 1999-10-19 |
| 5876881 | Manufacturing method for mask for charged-particle-beam transfer or mask for x-ray transfer | — | 1999-03-02 |
| 5798194 | Masks for charged-particle beam microlithography | Mamoru Nakasuji | 1998-08-25 |
| 5728492 | Mask for projection system using charged particle beam | — | 1998-03-17 |
| 5563411 | Scanning photoelectron microscope | Keitaro Hara | 1996-10-08 |
| 5446282 | Scanning photoelectron microscope | Keitaro Hara | 1995-08-29 |
| 5396067 | Scan type electron microscope | Shohei Suzuki, Keitaro Hara | 1995-03-07 |