Issued Patents All Time
Showing 1–25 of 27 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8390783 | Method of measuring the position of a mask surface along the height direction, exposure device, and exposure method | Keiichi Tanaka | 2013-03-05 |
| 8018577 | Illumination-sensor calibration methods, and exposure methods and apparatus and device-manufacturing methods including same, and reflective masks used in same | Hajime Yamamoto, Tohru Isogami, Kazuaki Suzuki | 2011-09-13 |
| 7862961 | Mask and exposure apparatus | — | 2011-01-04 |
| 7483123 | Substrate conveyor apparatus, substrate conveyance method and exposure apparatus | — | 2009-01-27 |
| 7433017 | Method of measuring the position of a mask surface along the height direction, exposure device, and exposure method | Keiichi Tanaka | 2008-10-07 |
| 6965114 | Apparatus and methods for mask/substrate alignment in charged-particle-beam pattern-transfer | — | 2005-11-15 |
| 6936831 | Divided reticles for charged-particle-beam microlithography apparatus, and methods for using same | Tomoharu Fujiwara, Kazuaki Suzuki, Teruaki Okino | 2005-08-30 |
| 6909490 | Reticle chambers and reticle cassettes providing temperature control and ready exchange of reticles for exposure | — | 2005-06-21 |
| 6841402 | Alignment-mark detection methods and devices for charged-particle-beam microlithography, and microelectronic-device manufacturing methods comprising same | — | 2005-01-11 |
| 6835511 | Methods and apparatus for detecting and correcting reticle deformations in microlithography | — | 2004-12-28 |
| 6750464 | Alignment-mark patterns defined on a stencil reticle and detectable, after lithographic transfer to a substrate, using an optical-based detector | Jin Udagawa | 2004-06-15 |
| 6657207 | Charged-particle-beam microlithography apparatus and methods including optical corrections made during subfield exposures | Shintaro Kawata, Teruaki Okino, Kazuaki Suzuki | 2003-12-02 |
| 6632722 | Fiducial mark bodies for charged-particle-beam (CPB) microlithography, methods for making same, and CPB microlithography apparatus comprising same | Tomoharu Fujiwara | 2003-10-14 |
| 6627903 | Methods and devices for calibrating a charged-particle-beam microlithography apparatus, and microelectronic-device fabrication methods comprising same | — | 2003-09-30 |
| 6627905 | Charged-particle-beam mask-based exposure apparatus employing a variable mask-illumination field and alignment and calibration methods therefor | — | 2003-09-30 |
| 6627906 | Control of exposure in charged-particle-beam microlithography based on beam-transmissivity of the reticle | — | 2003-09-30 |
| 6522519 | Electrostatic chucking device and methods for holding microlithographic sample | — | 2003-02-18 |
| 6521900 | Alignment marks for charged-particle-beam microlithography, and alignment methods using same | — | 2003-02-18 |
| 6447964 | Charged-particle-beam microlithography methods including chip-exposure sequences for reducing thermally induced lateral shift of exposure position on the substrate | Teruaki Okino, Tomoharu Fujiwara | 2002-09-10 |
| 6433346 | Electrostatic reticle chucks, charged-particle-beam microlithography apparatus and methods, and semiconductor-device manufacturing methods comprising same | — | 2002-08-13 |
| 6429090 | Fiducial mark bodies for charged-particle-beam (CPB) microlithography, methods for making same, and CPB microlithography apparatus comprising same | Tomoharu Fujiwara | 2002-08-06 |
| 6399945 | Backscattered-electron detection systems and associated methods | — | 2002-06-04 |
| 6204509 | Projection-microlithography apparatus, masks, and related methods incorporating reticle-distortion measurement and correction | Takehisa Yahiro | 2001-03-20 |
| 6180289 | Projection-microlithography mask with separate mask substrates | — | 2001-01-30 |
| 6171736 | Projection-microlithography alignment method utilizing mask with separate mask substrates | — | 2001-01-09 |