Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11276546 | Charged particle beam optical system, exposure apparatus, exposure method and device manufacturing method | — | 2022-03-15 |
| 7019313 | Methods and devices for evaluating beam blur in subfields projection-exposed by a charged-particle-beam microlithography apparatus | — | 2006-03-28 |
| 6861187 | Methods and devices for evaluating imaging characteristics of a charged-particle-beam microlithography system | — | 2005-03-01 |
| 6831282 | Methods and devices for evaluating beam blur in a charged-particle-beam microlithography apparatus | — | 2004-12-14 |
| 6635402 | Devices for measuring and adjusting illumination uniformity obtained from a charged-particle illumination-optical system | — | 2003-10-21 |
| 6531786 | Durable reference marks for use in charged-particle-beam (CPB) microlithography, and CPB microlithography apparatus and methods comprising same | — | 2003-03-11 |
| 6521392 | Methods for measuring and adjusting illumination uniformity obtained from a charged-particle illumination-optical system | — | 2003-02-18 |
| 6277532 | Charged-particle-beam microlithographic methods for correction of reticle distortions | — | 2001-08-21 |
| 6218058 | Charged particle beam transfer mask | Kazuaki Suzuki, Shin-ichi Kojima | 2001-04-17 |
| 6204509 | Projection-microlithography apparatus, masks, and related methods incorporating reticle-distortion measurement and correction | Noriyuki Hirayanagi | 2001-03-20 |