Issued Patents All Time
Showing 26–50 of 55 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6068952 | Registration accuracy measurement mark, method of repairing defect of the mark, photomask having the mark, method of manufacturing the photomask and method of exposure thereof | Koichiro Narimatsu, Shigenori Yamashita, Shinya Soeda, Atsushi Hachisuka, Koji Taniguchi +3 more | 2000-05-30 |
| 6048647 | Phase shift mask of attenuation type and manufacturing method thereof | Junji Miyazaki, Akihiro Nakae, Hidehiko Kozawa | 2000-04-11 |
| 5952128 | Phase-shifting photomask blank and method of manufacturing the same as well as phase-shifting photomask | Akihiko Isao, Susumu Kawada, Yoshihiro Saito, Tsuneo Yamamoto, Atsushi Hayashi +2 more | 1999-09-14 |
| 5938897 | Method of manufacturing phase-shifting photomask blank | Akihiko Isao, Susumu Kawada, Yoshihiro Saito, Tsuneo Yamamoto, Atsushi Hayashi +2 more | 1999-08-17 |
| 5892291 | Registration accuracy measurement mark | Koichiro Narimatsu, Shigenori Yamashita, Shinya Soeda, Atsushi Hachisuka, Koji Taniguchi +3 more | 1999-04-06 |
| 5830607 | Phase shift mask and manufacturing method thereof and exposure method using phase shift mask | Akihiko Isao, Ryoichi Kobayashi, Yaichiro Watakabe, Junji Miyazaki, Kouichiro Narimatsu +1 more | 1998-11-03 |
| 5691090 | Phase shift mask and manufacturing method thereof and exposure method using phase shift mask | Akihiko Isao, Ryoichi Kobayashi, Yaichiro Watakabe, Junji Miyazaki | 1997-11-25 |
| 5674647 | Phase shift mask and manufacturing method thereof and exposure method using phase shift mask | Akihiko Isao, Ryoichi Kobayashi, Yaichiro Watakabe, Junji Miyazaki, Kouichiro Narimatsu +1 more | 1997-10-07 |
| 5644381 | Method of exposure employing phase shift mask of attenuation type | Junji Miyazaki | 1997-07-01 |
| 5629114 | Phase shift mask and manufacturing method thereof and exposure method using phase shift mask comprising a semitransparent region | Akihiko Isao, Ryoichi Kobayashi, Yaichiro Watakabe, Junji Miyazaki | 1997-05-13 |
| 5605776 | Phase-shifting photomask blank, phase-shifting photomask, and method of manufacturing them | Akihiko Isao, Susumu Kawada, Atsushi Hayashi, Kazuyuki Maetoko | 1997-02-25 |
| 5593801 | Attenuating type phase shifting mask, method of manufacturing thereof and semiconductor device manufactured by using the mask | Junji Miyazaki | 1997-01-14 |
| 5585658 | Semiconductor device having diffusion regions formed with an ion beam absorber pattern | Takao Mukai | 1996-12-17 |
| 5543342 | Method of ion implantation | Takao Mukai | 1996-08-06 |
| 5496667 | X-ray mask and its fabrication method | Hideki Yabe, Kenji Marumoto | 1996-03-05 |
| 5489412 | Electrode material | Yasushi Noda, Toshimasa Fukai, Nobutaka Suzuki | 1996-02-06 |
| 5482799 | Phase shift mask and manufacturing method thereof | Akihiko Isao, Susumu Kawada | 1996-01-09 |
| 5480472 | Method for forming an electrical contact material | Yasushi Noda, Nobutaka Suzuki, Toshimasa Fukai, Tetsuo Yoshihara, Koichi Koshiro | 1996-01-02 |
| 5474864 | Phase shift mask and manufacturing method thereof and exposure method using phase shift mask | Akihiko Isao, Ryoichi Kobayashi, Yaichiro Watakabe, Junji Miyazaki | 1995-12-12 |
| 5464713 | Phase shift mask and method for repairing a defect of a phase shift mask | Kunihiro Hosono, Junji Miyazaki | 1995-11-07 |
| 5429897 | Attenuating type phase shifting mask and method of manufacturing thereof | Junji Miyazaki | 1995-07-04 |
| 5352404 | Process for forming contact material including the step of preparing chromium with an oxygen content substantially reduced to less than 0.1 wt. % | Toshimasa Fukai, Yasushi Noda, Nobutaka Suzuki | 1994-10-04 |
| 5132186 | Mask for X-ray lithography and method of manufacturing the same | Susumu Takeuchi | 1992-07-21 |
| 5023156 | Mask for X-ray lityhography and method of manufacturing the same | Susumu Takeuchi | 1991-06-11 |
| 4895779 | Method of forming a T shaped control electrode through an X-ray mask | Noriaki Ishio | 1990-01-23 |