Issued Patents All Time
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5830607 | Phase shift mask and manufacturing method thereof and exposure method using phase shift mask | Akihiko Isao, Ryoichi Kobayashi, Nobuyuki Yoshioka, Junji Miyazaki, Kouichiro Narimatsu +1 more | 1998-11-03 |
| 5691090 | Phase shift mask and manufacturing method thereof and exposure method using phase shift mask | Akihiko Isao, Ryoichi Kobayashi, Nobuyuki Yoshioka, Junji Miyazaki | 1997-11-25 |
| 5674647 | Phase shift mask and manufacturing method thereof and exposure method using phase shift mask | Akihiko Isao, Ryoichi Kobayashi, Nobuyuki Yoshioka, Junji Miyazaki, Kouichiro Narimatsu +1 more | 1997-10-07 |
| 5629114 | Phase shift mask and manufacturing method thereof and exposure method using phase shift mask comprising a semitransparent region | Akihiko Isao, Ryoichi Kobayashi, Nobuyuki Yoshioka, Junji Miyazaki | 1997-05-13 |
| 5474864 | Phase shift mask and manufacturing method thereof and exposure method using phase shift mask | Akihiko Isao, Ryoichi Kobayashi, Nobuyuki Yoshioka, Junji Miyazaki | 1995-12-12 |
| 5322748 | Photomask and a method of manufacturing thereof comprising trapezoidal shaped light blockers covered by a transparent layer | Shuichi Matsuda | 1994-06-21 |
| 5266424 | Method of forming pattern and method of manufacturing photomask using such method | Takeshi Fujino | 1993-11-30 |
| 4985319 | Process for manufacturing a photomask | Tatsuo Okamoto, Shuichi Matsuda | 1991-01-15 |
| 4957834 | Method for manufacturing photomask | Shuichi Matsuda | 1990-09-18 |
| 4876164 | Process for manufacturing a photomask | Tatsuo Okamoto, Shuichi Matsuda | 1989-10-24 |
| 4873163 | Photomask material | Hiroaki Morimoto, Tatsuo Okamoto | 1989-10-10 |
| 4792461 | Method of forming a photomask material | Shuichi Matsuda | 1988-12-20 |
| 4783371 | Photomask material | Shuichi Matsuda | 1988-11-08 |
| 4722878 | Photomask material | Kazuhiro Tanaka, Masahiro Hirosue | 1988-02-02 |
| 4717625 | Photomask material | Shuichi Matsuda | 1988-01-05 |
| 4678714 | Photomask material | — | 1987-07-07 |