Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7282308 | Phase shifter film and process for the same | Susumu Kawada, Nobuyuki Yoshioka, Kazuyuki Maetoko | 2007-10-16 |
| 7090947 | Phase shifter film and process for the same | Susumu Kawada, Nobuyuki Yoshioka, Kazuyuki Maetoko | 2006-08-15 |
| 6689515 | Phase-shifting photomask blank, phase-shifting photomask, method for producing them and apparatus for manufacturing the blank | Nobuyuki Yoshioka, Susumu Kawada, Tsuneo Yamamoto, Jun Amano, Ryoichi Kobayashi | 2004-02-10 |
| 6569577 | Phase-shift photo mask blank, phase-shift photo mask and method for fabricating semiconductor devices | Susumu Kawada, Shuichiro Kanai, Nobuyuki Yoshioka, Kazuyuki Maetoko | 2003-05-27 |
| 6228541 | Phase-shifting photomask blank, phase-shifting photomask, method for producing them and apparatus for manufacturing the blank | Susumu Kawada, Tsuneo Yamamoto, Jun Amano, Ryoichi Kobayashi, Nobuyuki Yoshioka | 2001-05-08 |
| 5952128 | Phase-shifting photomask blank and method of manufacturing the same as well as phase-shifting photomask | Susumu Kawada, Yoshihiro Saito, Tsuneo Yamamoto, Atsushi Hayashi, Nobuyuki Yoshioka +2 more | 1999-09-14 |
| 5938897 | Method of manufacturing phase-shifting photomask blank | Susumu Kawada, Yoshihiro Saito, Tsuneo Yamamoto, Atsushi Hayashi, Nobuyuki Yoshioka +2 more | 1999-08-17 |
| 5830607 | Phase shift mask and manufacturing method thereof and exposure method using phase shift mask | Ryoichi Kobayashi, Nobuyuki Yoshioka, Yaichiro Watakabe, Junji Miyazaki, Kouichiro Narimatsu +1 more | 1998-11-03 |
| 5691090 | Phase shift mask and manufacturing method thereof and exposure method using phase shift mask | Ryoichi Kobayashi, Nobuyuki Yoshioka, Yaichiro Watakabe, Junji Miyazaki | 1997-11-25 |
| 5674647 | Phase shift mask and manufacturing method thereof and exposure method using phase shift mask | Ryoichi Kobayashi, Nobuyuki Yoshioka, Yaichiro Watakabe, Junji Miyazaki, Kouichiro Narimatsu +1 more | 1997-10-07 |
| 5629114 | Phase shift mask and manufacturing method thereof and exposure method using phase shift mask comprising a semitransparent region | Ryoichi Kobayashi, Nobuyuki Yoshioka, Yaichiro Watakabe, Junji Miyazaki | 1997-05-13 |
| 5605776 | Phase-shifting photomask blank, phase-shifting photomask, and method of manufacturing them | Susumu Kawada, Atsushi Hayashi, Nobuyuki Yoshioka, Kazuyuki Maetoko | 1997-02-25 |
| 5482799 | Phase shift mask and manufacturing method thereof | Susumu Kawada, Nobuyuki Yoshioka | 1996-01-09 |
| 5474864 | Phase shift mask and manufacturing method thereof and exposure method using phase shift mask | Ryoichi Kobayashi, Nobuyuki Yoshioka, Yaichiro Watakabe, Junji Miyazaki | 1995-12-12 |
| 4428979 | Method for forming an inhomogeneous optical layer | Kazuo Nakamura, Hirotsugu Mizorogi | 1984-01-31 |
| 4428980 | Method for forming an inhomogeneous optical layer | Kazuo Nakamura, Hirotsugu Mizorogi | 1984-01-31 |
| 4416216 | Apparatus for forming an inhomogeneous optical layer | Kazuo Nakamura, Hirotsugu Mizorogi | 1983-11-22 |
| 4416217 | Apparatus for forming an inhomogeneous optical layer | Kazuo Nakamura, Hirotsugu Mizorogi | 1983-11-22 |