Issued Patents All Time
Showing 1–25 of 55 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10496226 | Optical sensing unit and touch panel device including the same | Koichi Sugiyama | 2019-12-03 |
| 10152174 | Position input device and touch panel | Koichi Sugiyama | 2018-12-11 |
| 9304420 | Two-component developer, developing device, image forming apparatus, and image forming method | Takanori Kamoto, Osamu Wada, Tadashi Iwamatsu | 2016-04-05 |
| 9127099 | Polymer and method for producing same | Norio Iwakiri, Yosuke Matsuoka, Yuki Yamashita, Nobuyuki Sakamoto | 2015-09-08 |
| 8741525 | Resin coated carrier, two-component developer, developing device and image forming apparatus | Osamu Wada, Takanori Kamoto, Tadashi Iwamatsu, Hiroyuki Hirakawa, Yoshinori Mutoh +3 more | 2014-06-03 |
| 8735041 | Method for producing resin-coated carrier, resin-coated carrier, two-component developer, developing device, image forming apparatus and image forming method | Takanori Kamoto, Takayuki Yamanaka, Osamu Wada, Tadashi Iwamatsu | 2014-05-27 |
| 8680314 | Amino group-containing phosphorylcholine, and method for producing same | Nobuyuki Sakamoto, Yosuke Matsuoka, Norio Iwakiri | 2014-03-25 |
| 8580904 | Silicone monomer | Yosuke Matsuoka, Mao Sorimachi, Nobuyuki Sakamoto | 2013-11-12 |
| 8481608 | Silicone monomer | Yosuke Matsuoka, Nobuyuki Sakamoto, Toshiya Itei, Ryota KOBAYASHI, Mao Sorimachi | 2013-07-09 |
| 8409778 | Resin coated carrier, two-component developer, developing device and image forming apparatus | Osamu Wada, Tadashi Iwamatsu, Takanori Kamoto, Natsuki Matsuura, Nobuhiro Seki +1 more | 2013-04-02 |
| 8293446 | Resin-coated carrier method of manufacturing the same, two-component developer including resin-coated carrier, developing device and image forming apparatus | Osamu Wada, Takanori Kamoto, Ayae Nagaoka, Tadashi Iwamatsu | 2012-10-23 |
| 8192908 | Carrier, developer, development device, image forming apparatus and image forming method | Takanori Kamoto, Tadashi Iwamatsu, Yoshinori Mutoh, Hiroyuki Hirakawa, Takashi Hara | 2012-06-05 |
| 7282308 | Phase shifter film and process for the same | Susumu Kawada, Akihiko Isao, Kazuyuki Maetoko | 2007-10-16 |
| 7090947 | Phase shifter film and process for the same | Susumu Kawada, Akihiko Isao, Kazuyuki Maetoko | 2006-08-15 |
| 7077915 | Method of and apparatus for washing photomask and washing solution for photomask | Yoshikazu Nagamura, Koji Yamanaka, Hozumi Usui | 2006-07-18 |
| 7029635 | System for treating material containing noxious components | Yoshiyuki Kashiwagi, Haruhisa Ishigaki | 2006-04-18 |
| 6689515 | Phase-shifting photomask blank, phase-shifting photomask, method for producing them and apparatus for manufacturing the blank | Akihiko Isao, Susumu Kawada, Tsuneo Yamamoto, Jun Amano, Ryoichi Kobayashi | 2004-02-10 |
| 6569577 | Phase-shift photo mask blank, phase-shift photo mask and method for fabricating semiconductor devices | Akihiko Isao, Susumu Kawada, Shuichiro Kanai, Kazuyuki Maetoko | 2003-05-27 |
| 6376738 | Process and system for treating material containing noxious components | Yoshiyuki Kashiwagi, Haruhisa Ishigaki | 2002-04-23 |
| 6340543 | Photomask, manufacturing method thereof, and semiconductor device | Yoshikazu Nagamura, Kazuhito Suzuki, Kunihiro Hosono | 2002-01-22 |
| 6323560 | Registration accuracy measurement mark, method of repairing defect of the mark, photomask having the mark, method of manufacturing the photo mask and method of exposure thereof | Koichiro Narimatsu, Shigenori Yamashita, Shinya Soeda, Atsushi Hachisuka, Koji Taniguchi +3 more | 2001-11-27 |
| 6277205 | Method and apparatus for cleaning photomask | Yoshikazu Nagamura, Hozumi Usui, Koji Yamanaka | 2001-08-21 |
| 6228541 | Phase-shifting photomask blank, phase-shifting photomask, method for producing them and apparatus for manufacturing the blank | Akihiko Isao, Susumu Kawada, Tsuneo Yamamoto, Jun Amano, Ryoichi Kobayashi | 2001-05-08 |
| 6209553 | Method of and apparatus for washing photomask and washing solution for photomask | Yoshikazu Nagamura, Koji Yamanaka, Masaki Kusuhara | 2001-04-03 |
| 6071376 | Method and apparatus for cleaning photomask | Yoshikazu Nagamura, Hozumi Usui, Koji Yamanaka | 2000-06-06 |