YN

Yoshikazu Nagamura

RT Renesas Technology: 9 patents #297 of 3,337Top 9%
MC M. Watanabe & Co.: 4 patents #1 of 18Top 6%
Mitsubishi Electric: 4 patents #7,099 of 25,717Top 30%
OR Organo: 4 patents #26 of 167Top 20%
TC Toppan Printing Co.: 2 patents #414 of 1,467Top 30%
RE Renesas Electronics: 2 patents #1,855 of 4,529Top 45%
Dai Nippon Printing Co.: 2 patents #976 of 2,222Top 45%
RE Ryoden Semiconductor System Engineering: 1 patents #111 of 195Top 60%
Overall (All Time): #320,012 of 4,157,543Top 8%
15
Patents All Time

Issued Patents All Time

Showing 1–15 of 15 patents

Patent #TitleCo-InventorsDate
10861786 Semiconductor device having a multilayer structure Takashi Ipposhi, Katsumi Eikyu 2020-12-08
8156451 Method of manufacturing photomask Shogo Narukawa 2012-04-10
7926010 Method of determining defects in photomask Shogo Narukawa 2011-04-12
7771904 Photomask, and method and apparatus for producing the same Kouji Tange, Kouki Hayashi, Hidehiro Ikeda 2010-08-10
7585599 Photomask, and method and apparatus for producing the same Kouji Tange, Kouki Hayashi, Hidehiro Ikeda 2009-09-08
7582397 Photomask, and method and apparatus for producing the same Kouji Tange, Kouki Hayashi, Hidehiro Ikeda 2009-09-01
7264905 Photomask, and method and apparatus for producing the same Kouji Tange, Kouki Hayashi, Hidehiro Ikeda 2007-09-04
7077915 Method of and apparatus for washing photomask and washing solution for photomask Nobuyuki Yoshioka, Koji Yamanaka, Hozumi Usui 2006-07-18
7001470 Cleaning process for photomasks Koji Tange, Kunihiro Hosono, Yasutaka Kikuchi, Yuki Oomasa, Koichi Kido 2006-02-21
6877151 Photomask visual inspection system 2005-04-05
6740896 Sensitivity adjusting method for pattern inspection apparatus 2004-05-25
6340543 Photomask, manufacturing method thereof, and semiconductor device Kazuhito Suzuki, Kunihiro Hosono, Nobuyuki Yoshioka 2002-01-22
6277205 Method and apparatus for cleaning photomask Nobuyuki Yoshioka, Hozumi Usui, Koji Yamanaka 2001-08-21
6209553 Method of and apparatus for washing photomask and washing solution for photomask Nobuyuki Yoshioka, Koji Yamanaka, Masaki Kusuhara 2001-04-03
6071376 Method and apparatus for cleaning photomask Nobuyuki Yoshioka, Hozumi Usui, Koji Yamanaka 2000-06-06