NM

Nihar Mohanty

Meta: 30 patents #131 of 6,845Top 2%
TL Tokyo Electron Limited: 25 patents #181 of 5,567Top 4%
📍 Snoqualmie, WA: #5 of 292 inventorsTop 2%
🗺 Washington: #862 of 76,902 inventorsTop 2%
Overall (All Time): #42,521 of 4,157,543Top 2%
57
Patents All Time

Issued Patents All Time

Showing 26–50 of 57 patents

Patent #TitleCo-InventorsDate
10935889 Extreme ultra-violet sensitivity reduction using shrink and growth method Lior Huli 2021-03-02
10930764 Extension region for a semiconductor device Kandabara Tapily, Jeffrey Smith, Anton J. deVilliers 2021-02-23
10895671 Diffraction grating with a variable refractive index using ion implantation Giuseppe Calafiore, Austin Lane, Matthew E. Colburn 2021-01-19
10845526 Outward coupling suppression in waveguide display Hee Yoon Lee, Ningfeng Huang, Pasi Saarikko, Yu Shi, Giuseppe Calafiore 2020-11-24
10838121 Manufacturing three-dimensional diffraction gratings by selective deposition or selective etching Giuseppe Calafiore, Matthew E. Colburn, Austin Lane, Matthieu Charles Raoul Leibovici 2020-11-17
10732351 Gratings with variable depths formed using planarization for waveguide displays Matthew E. Colburn, Giuseppe Calafiore, Matthieu Charles Raoul Leibovici 2020-08-04
10712481 Fabricating of diffraction grating by ion beam etching Giuseppe Calafiore, Matthew E. Colburn, Austin Lane, Matthieu Charles Raoul Leibovici 2020-07-14
10684407 Reactivity enhancement in ion beam etcher 2020-06-16
10649119 Duty cycle, depth, and surface energy control in nano fabrication Matthieu Charles Raoul Leibovici 2020-05-12
10649141 Gratings with variable etch heights for waveguide displays Matthew E. Colburn, Giuseppe Calafiore, Matthieu Charles Raoul Leibovici 2020-05-12
10580660 Gas phase etching system and method Subhadeep Kal, Angelique Raley, Aelan Mosden, Scott Lefevre 2020-03-03
10580650 Method for bottom-up formation of a film in a recessed feature David L. O'Meara, Kandabara Tapily 2020-03-03
10529830 Extension region for a semiconductor device Kandabara Tapily, Jeffrey Smith, Anton J. deVilliers 2020-01-07
10502958 H2-assisted slanted etching of high refractive index material 2019-12-10
10366890 Method for patterning a substrate using a layer with multiple materials Anton J. deVilliers 2019-07-30
10354873 Organic mandrel protection process Akiteru Ko, Angelique Raley, Sophie Thibaut, Satoru Nakamura 2019-07-16
10319637 Method for fully self-aligned via formation using a directed self assembly (DSA) process Elliott Franke, Richard A. Farrell 2019-06-11
10274651 Manufacturing three-dimensional diffraction gratings by selective deposition or selective etching Giuseppe Calafiore, Matthew E. Colburn, Austin Lane, Matthieu Charles Raoul Leibovici 2019-04-30
10256110 Self-aligned patterning process utilizing self-aligned blocking and spacer self-healing 2019-04-09
10256140 Method of reducing overlay error in via to grid patterning 2019-04-09
10236186 Methods for dry hard mask removal on a microelectronic substrate 2019-03-19
10141183 Methods of spin-on deposition of metal oxides Lior Huli, Jeffrey Smith, Richard A. Farrell 2018-11-27
10083842 Methods of sub-resolution substrate patterning Anton J. deVilliers, Jeffrey Smith 2018-09-25
10049892 Method for processing photoresist materials and structures Eric Chih-Fang Liu, Elliott Franke 2018-08-14
9997598 Three-dimensional semiconductor device and method of fabrication Jeffrey Smith, Anton J. deVilliers, Subhadeep Kal, Kandabara Tapily 2018-06-12