Issued Patents All Time
Showing 51–74 of 74 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7605086 | Corrosion resistant component of semiconductor processing equipment and method of manufacture thereof | Robert O'Donnell, Christopher C. Chang | 2009-10-20 |
| 7578889 | Methodology for cleaning of surface metal contamination from electrode assemblies | Hong Shih, Yaobo Yin, Shun Wu, Armen Avoyan, Linda (Tong) Jiang | 2009-08-25 |
| 7578945 | Method and apparatus for tuning a set of plasma processing steps | Vahid Vahedi, Harmeet Singh, Anthony Chen | 2009-08-25 |
| 7402258 | Methods of removing metal contaminants from a component for a plasma processing apparatus | Mark Kiehlbauch, Harmeet Singh | 2008-07-22 |
| 7311797 | Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor | Robert O'Donnell | 2007-12-25 |
| 7300537 | Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor | Robert O'Donnell | 2007-11-27 |
| 7255898 | Zirconia toughened ceramic components and coatings in semiconductor processing equipment and method of manufacture thereof | Robert O'Donnell, Christopher C. Chang | 2007-08-14 |
| 7250114 | Methods of finishing quartz glass surfaces and components made by the methods | Mark Kiehlbauch | 2007-07-31 |
| 7234222 | Methods and apparatus for optimizing the delivery of a set of gases in a plasma processing system | Fangli Hao | 2007-06-26 |
| 7138067 | Methods and apparatus for tuning a set of plasma processing steps | Vahid Vahedi, Harmeet Singh, Anthony Chen | 2006-11-21 |
| 7128804 | Corrosion resistant component of semiconductor processing equipment and method of manufacture thereof | Robert O'Donnell, Christopher C. Chang | 2006-10-31 |
| 6994769 | In-situ cleaning of a polymer coated plasma processing chamber | Harmeet Singh, Vahid Vahedi, Saurabh Ullal | 2006-02-07 |
| 6830622 | Cerium oxide containing ceramic components and coatings in semiconductor processing equipment and methods of manufacture thereof | Robert O'Donnell | 2004-12-14 |
| 6821378 | Pump baffle and screen to improve etch uniformity | Neil Benjamin, Song Huang | 2004-11-23 |
| 6790242 | Fullerene coated component of semiconductor processing equipment and method of manufacturing thereof | Robert O'Donnell, Christopher C. Chang | 2004-09-14 |
| 6776851 | In-situ cleaning of a polymer coated plasma processing chamber | Harmeet Singh, Vahid Vahedi, Saurabh Ullal | 2004-08-17 |
| 6773751 | Boron nitride/yttria composite components of semiconductor processing equipment and method of manufacturing thereof | Robert O'Donnell, Christopher C. Chang | 2004-08-10 |
| 6770214 | Method of reducing aluminum fluoride deposits in plasma etch reactor | Duane Outka, Yousun Kim, Anthony Chen | 2004-08-03 |
| 6620520 | Zirconia toughened ceramic components and coatings in semiconductor processing equipment and method of manufacture thereof | Robert O'Donnell, Christopher C. Chang | 2003-09-16 |
| 6613442 | Boron nitride/yttria composite components of semiconductor processing equipment and method of manufacturing thereof | Robert O'Donnell, Christopher C. Chang | 2003-09-02 |
| 6537429 | Diamond coatings on reactor wall and method of manufacturing thereof | Robert O'Donnell, Christopher C. Chang | 2003-03-25 |
| 6533910 | Carbonitride coated component of semiconductor processing equipment and method of manufacturing thereof | Robert O'Donnell, Christopher C. Chang | 2003-03-18 |
| 6344105 | Techniques for improving etch rate uniformity | Neil Benjamin, Jeff A. Bogart, Vahid Vahedi, David Cooperberg, Alan J. Miller +1 more | 2002-02-05 |
| 6016766 | Microwave plasma processor | David R. Pirkle, Michael Giarratano, C. Robert Koemtzopoulos, Felix Kozakevich | 2000-01-25 |