Issued Patents All Time
Showing 26–50 of 66 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8373258 | Semiconductor device and production method thereof | Shinya Mizusaki | 2013-02-12 |
| 8343692 | Exposure apparatus inspection mask and exposure apparatus inspection method | Nobuhiro Komine | 2013-01-01 |
| 8293456 | Semiconductor device manufacturing method | Takaki Hashimoto, Kazuyuki Masukawa, Yasunobu Kai | 2012-10-23 |
| 8294889 | Method for inspecting nano-imprint template | Hiroyuki Kashiwagi | 2012-10-23 |
| 8142960 | Exposure method, mask data producing method, and semiconductor device manufacturing method | Satoshi Nagai | 2012-03-27 |
| 8122385 | Mask pattern correcting method | Tatsuhiko Higashiki, Toshiya Kotani, Satoshi Tanaka, Takashi Sato, Akiko Mimotogi +1 more | 2012-02-21 |
| 8097942 | Semiconductor device including power supply bar having jutted portion, parallel running portion and bent portion and manufacturing method therefor | Kazuyuki Misumi, Katsuyuki Fukudome, Kazushi Hatauchi, Kunihiro Yamashita | 2012-01-17 |
| 8085393 | Exposure apparatus inspection method and method for manufacturing semiconductor device | Kentaro Kasa, Takashi Sato | 2011-12-27 |
| 8077292 | Projection exposure method | Yosuke Kitamura, Masaki Satake, Shoji Mimotogi | 2011-12-13 |
| 8072601 | Pattern monitor mark and monitoring method suitable for micropattern | Kazutaka Ishigo | 2011-12-06 |
| 7960075 | Photomask unit, exposing method and method for manufacturing semiconductor device | Satoshi Nagai, Masamitsu Itoh, Kenji Kawano, Satoshi Tanaka | 2011-06-14 |
| 7925090 | Method of determining photo mask, method of manufacturing semiconductor device, and computer program product | Toshiya Kotani, Kyoko Izuha | 2011-04-12 |
| 7904851 | Photomask manufacturing method and semiconductor device manufacturing method | Masamitsu Itoh, Takashi Hirano | 2011-03-08 |
| 7807323 | Exposure condition setting method, semiconductor device manufacturing method, and exposure condition setting program | — | 2010-10-05 |
| 7803502 | Photomask and method of manufacturing semiconductor device using the photomask | Takashi Sato | 2010-09-28 |
| 7740994 | Method for selecting photomask substrate, method for manufacturing photomask, and method for manufacturing semiconductor device | Masamitsu Itoh | 2010-06-22 |
| 7716628 | System, method and program for generating mask data, exposure mask and semiconductor device in consideration of optical proximity effects | Satoshi Tanaka, Toshiya Kotani | 2010-05-11 |
| 7692769 | Exposure apparatus, exposure method, and semiconductor device manufacturing method | Takashi Sato | 2010-04-06 |
| 7691542 | Exposure system, test mask for flare testing, method for evaluating lithography process, method for evaluating exposure tools, method for generating corrected mask pattern, and method for manufacturing semiconductor device | — | 2010-04-06 |
| 7685556 | Mask data correction method, photomask manufacturing method, computer program, optical image prediction method, resist pattern shape prediction method, and semiconductor device manufacturing method | Daisuke Kawamura, Shoji Mimotogi | 2010-03-23 |
| 7676078 | Inspection method, processor and method for manufacturing a semiconductor device | — | 2010-03-09 |
| 7652747 | Immersion exposure method and immersion exposure apparatus which transfer image of pattern formed on mask onto substrate through immersion medium | Takuya Kono, Daisuke Kawamura | 2010-01-26 |
| 7586605 | Method for testing a polarization state, method for manufacturing a semiconductor device, and test substrate for testing a polarization state | — | 2009-09-08 |
| 7556896 | Inspection method and photomask | Satoshi Tanaka, Soichi Inoue | 2009-07-07 |
| 7537869 | Evaluation of pattern formation process, photo masks for the evaluation, and fabrication method of a semiconductor device with the evaluation process | Masafumi Asano | 2009-05-26 |