Issued Patents All Time
Showing 51–63 of 63 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6794285 | Slurry for CMP, and method of manufacturing semiconductor device | Yukiteru Matsui, Hiroyuki Yano | 2004-09-21 |
| 6790769 | CMP slurry and method of manufacturing semiconductor device | Nobuyuki Kurashima, Hiroyuki Yano | 2004-09-14 |
| 6740590 | AQUEOUS DISPERSION, AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING USED FOR MANUFACTURE OF SEMICONDUCTOR DEVICES, METHOD FOR MANUFACTURE OF SEMICONDUCTOR DEVICES, AND METHOD FOR FORMATION OF EMBEDDED WRITING | Hiroyuki Yano, Yukiteru Matsui, Katsuya Okumura, Akira Iio, Masayuki Hattori | 2004-05-25 |
| 6720250 | Method of manufacturing a semiconductor device using a slurry for chemical mechanical polishing of copper | Hiroyuki Yano | 2004-04-13 |
| 6653267 | Aqueous dispersion for chemical mechanical polishing used for polishing of copper | Hiroyuki Yano, Masayuki Motonari, Masayuki Hattori, Nobuo Kawahashi | 2003-11-25 |
| 6611060 | Semiconductor device having a damascene type wiring layer | Hiroshi Toyoda, Hiroyuki Yano, Dai Fukushima, Tetsuo Matsuda, Hisashi Kaneko | 2003-08-26 |
| 6576554 | Slurry for CMP, method of forming thereof and method of manufacturing semiconductor device including a CMP process | Yukiteru Matsui, Hiroyuki Yano, Dai Fukushima | 2003-06-10 |
| 6454819 | Composite particles and production process thereof, aqueous dispersion, aqueous dispersion composition for chemical mechanical polishing, and process for manufacture of semiconductor device | Hiroyuki Yano, Yukiteru Matsui, Katsuya Okumura, Masayuki Motonari, Masayuki Hattori +1 more | 2002-09-24 |
| 6444139 | Slurry for CMP and CMP method | Hiroyuki Yano | 2002-09-03 |
| 6375545 | Chemical mechanical method of polishing wafer surfaces | Hiroyuki Yano, Yukiteru Matsui, Nobuo Hayasaka, Katsuya Okumura, Akira Iio +2 more | 2002-04-23 |
| 6312321 | Polishing apparatus | Dai Fukushima, Hiroyuki Yano | 2001-11-06 |
| 6090699 | Method of making a semiconductor device | Hisako Aoyama, Kyoichi Suguro, Hiromi Niiyama, Hitoshi Tamura, Hisataka Hayashi +2 more | 2000-07-18 |
| 5592024 | Semiconductor device having a wiring layer with a barrier layer | Hisako Aoyama, Kyoichi Suguro, Hiromi Niiyama, Hitoshi Tamura, Hisataka Hayashi +2 more | 1997-01-07 |