Issued Patents All Time
Showing 26–44 of 44 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7014529 | Substrate processing method and substrate processing apparatus | Takeo Kubota, Gen Toyota | 2006-03-21 |
| 7005382 | Aqueous dispersion for chemical mechanical polishing, chemical mechanical polishing process, production process of semiconductor device and material for preparing an aqueous dispersion for chemical mechanical polishing | Kazuo Nishimoto, Tatsuaki Sakano, Akihiro Takemura, Masayuki Hattori, Nobuo Kawahashi +3 more | 2006-02-28 |
| 6997782 | Polishing apparatus and a method of polishing and cleaning and drying a wafer | Toyomi Nishi, Tetsuji Togawa, Harumitsu Saito, Manabu Tsujimura, Hiromi Yajima +7 more | 2006-02-14 |
| 6984532 | Method of judging residual film by optical measurement | Takeo Kubota | 2006-01-10 |
| 6743645 | Method of inspecting process for manufacturing semiconductor device and method of manufacturing semiconductor device | Takeo Kubota | 2004-06-01 |
| 6500051 | Polishing apparatus and method | Toyomi Nishi, Tetsuji Togawa, Harumitsu Saito, Manabu Tsujimura, Hiromi Yajima +7 more | 2002-12-31 |
| 5948205 | Polishing apparatus and method for planarizing layer on a semiconductor wafer | Masako Kodera, Hiroyuki Yano, Riichirou Aoki, Hiromi Yajima, Haruo Okano | 1999-09-07 |
| 5914275 | Polishing apparatus and method for planarizing layer on a semiconductor wafer | Masako Kodera, Hiroyuki Yano, Riichirou Aoki, Hiromi Yajima, Haruo Okano | 1999-06-22 |
| 5860181 | Method of and apparatus for cleaning workpiece | Toshiro Maekawa, Satomi Hamada, Koji Ono, Masako Kodera | 1999-01-19 |
| 5846335 | Method for cleaning workpiece | Toshiro Maekawa, Koji Ono, Motoaki Okada, Tamami Takahashi, Shiro Mishima +3 more | 1998-12-08 |
| 5830041 | Method and apparatus for determining endpoint during a polishing process | Tamami Takahashi, Fumihiko Sakata, Norio Kimura, Masako Kodera | 1998-11-03 |
| 5695601 | Method for planarizing a semiconductor body by CMP method and an apparatus for manufacturing a semiconductor device using the method | Masako Kodera, Shiro Mishima, Hiromi Yajima, Riichirou Aoki | 1997-12-09 |
| 5679059 | Polishing aparatus and method | Toyomi Nishi, Tetsuji Togawa, Harumitsu Saito, Manabu Tsujimura, Hiromi Yajima +7 more | 1997-10-21 |
| 5653623 | Polishing apparatus with improved exhaust | Norio Kimura, Seiji Ishikawa, Masako Kodera, Riichirou Aoki | 1997-08-05 |
| 5616063 | Polishing apparatus | Katsuya Okumura, Riichirou Aoki, Hiromi Yajima, Masako Kodera, Shirou Mishima +3 more | 1997-04-01 |
| 5597341 | Semiconductor planarizing apparatus | Masako Kodera, Hiroyuki Yano, Riichirou Aoki, Hiromi Yajima, Haruo Okano | 1997-01-28 |
| 5578531 | Method for manufacturing semiconductor device | Masako Kodera, Hiroyuki Yano | 1996-11-26 |
| 5445996 | Method for planarizing a semiconductor device having a amorphous layer | Masako Kodera, Hiroyuki Yano, Riichirou Aoki, Hiromi Yajima, Haruo Okano | 1995-08-29 |
| 5398459 | Method and apparatus for polishing a workpiece | Katsuya Okumura, Tohru Watanabe, Riichirou Aoki, Hiroyuki Yano, Masako Kodera +4 more | 1995-03-21 |