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Semiconductor devices suitable for narrow pitch applications and methods of fabrication thereof |
Udayan Ganguly, Jing Tang, Sunderraj Thirupapuliyur, Christopher S. Olsen, Shiyu Sun +6 more |
2016-12-27 |
| 9431237 |
Post treatment methods for oxide layers on semiconductor devices |
Kai Ma, Christopher S. Olsen |
2016-08-30 |
| 9117661 |
Method of improving oxide growth rate of selective oxidation processes |
Norman L. Tam, Balasubramanian Ramachandran, Martin John Ripley |
2015-08-25 |
| 9023700 |
Method and apparatus for single step selective nitridation |
Udayan Ganguly, Theresa Kramer Guarini, Matthew S. Rogers, Johanes S. Swenberg, Malcolm J. Bevan |
2015-05-05 |
| 8916484 |
Remote plasma radical treatment of silicon oxide |
Christopher S. Olsen |
2014-12-23 |
| 8888916 |
Thermal reactor with improved gas flow distribution |
Ming-Kuei Tseng, Norman L. Tam, Agus Sofian Tjandra, Robert Navasca, Mehran Behdjat +3 more |
2014-11-18 |
| 8748259 |
Method and apparatus for single step selective nitridation |
Udayan Ganguly, Theresa Kramer Guarini, Matthew S. Rogers, Johanes S. Swenberg, Malcolm J. Bevan |
2014-06-10 |
| 8741785 |
Remote plasma radical treatment of silicon oxide |
Christopher S. Olsen |
2014-06-03 |
| 8608853 |
Thermal reactor with improved gas flow distribution |
Ming-Kuei Tseng, Norman L. Tam, Agus Sofian Tjandra, Robert Navasca, Mehran Behdjat +3 more |
2013-12-17 |
| 8546271 |
Method of improving oxide growth rate of selective oxidation processes |
Norman L. Tam, Balasubramanian Ramachandran, Martin John Ripley |
2013-10-01 |
| 8497193 |
Method of thermally treating silicon with oxygen |
Sundar Ramamurthy, Vedapuram S. Achutharaman, Cory Czarnik, Mehran Behdjat, Christopher S. Olsen |
2013-07-30 |
| 8492292 |
Methods of forming oxide layers on substrates |
Christopher S. Olsen, Agus Sofian Tjandra, Yonah Cho, Matthew S. Rogers |
2013-07-23 |
| 8435906 |
Methods for forming conformal oxide layers on semiconductor devices |
Agus Sofian Tjandra, Christopher S. Olsen, Johanes F. Swenberg |
2013-05-07 |
| 8409353 |
Water cooled gas injector |
Sundar Ramamurthy, Vedapuram S. Achutharaman, Cory Czarnik, Mehran Behdjat, Christopher S. Olsen |
2013-04-02 |
| 8207044 |
Methods for oxidation of a semiconductor device |
Rajesh Mani, Norman L. Tam, Timothy Weidman |
2012-06-26 |
| 8056500 |
Thermal reactor with improved gas flow distribution |
Ming-Kuei Tseng, Norman L. Tam, Agus Sofian Tjandra, Robert Navasca, Mehran Behdjat +3 more |
2011-11-15 |
| 8043981 |
Dual frequency low temperature oxidation of a semiconductor device |
Kai Ma, Christopher S. Olsen |
2011-10-25 |
| 7972441 |
Thermal oxidation of silicon using ozone |
Sundar Ramamurthy, Vedapuram S. Achutharaman, Cory Czarnik, Mehran Behdjat, Christopher S. Olsen |
2011-07-05 |
| 7951728 |
Method of improving oxide growth rate of selective oxidation processes |
Norman L. Tam, Balasubramanian Ramachandran, Martin John Ripley |
2011-05-31 |
| 7947561 |
Methods for oxidation of a semiconductor device |
Rajesh Mani, Norman L. Tam, Timothy Weidman |
2011-05-24 |
| 7547633 |
UV assisted thermal processing |
Joseph M. Ranish |
2009-06-16 |
| 6713127 |
Methods for silicon oxide and oxynitride deposition using single wafer low pressure CVD |
Janardhanan Anand Subramony, Ramaseshan Iyer, Lee Luo, Aihua Chen |
2004-03-30 |