Issued Patents All Time
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9208998 | Multi-station decoupled reactive ion etch chamber | Gerald Yin, Tuqiang Ni, Jinyuan Chen | 2015-12-08 |
| 8366829 | Multi-station decoupled reactive ion etch chamber | Gerald Yin, Tuqiang Ni, Jinyuan Chen | 2013-02-05 |
| 7503996 | Multiple frequency plasma chamber, switchable RF system, and processes using same | Jinyuan Chen, Gerald Yin, Tuqiang Ni, Hiroshi Iizuka | 2009-03-17 |
| 6808647 | Methodologies to reduce process sensitivity to the chamber condition | Songlin Xu, Zhiwen Sun, Dragan Podlesnik | 2004-10-26 |
| 6635578 | Method of operating a dual chamber reactor with neutral density decoupled from ion density | Songlin Xu, John Holland | 2003-10-21 |
| 6544896 | Method for enhancing etching of TiSix | Songlin Xu, Takakazu Kusuki | 2003-04-08 |
| 6447637 | Process chamber having a voltage distribution electrode | Valentin Todorov, Robert E. Ryan, Arthur H. Sato, Jin-Yuan Chen, Zhiwen Sun | 2002-09-10 |
| 6367410 | Closed-loop dome thermal control apparatus for a semiconductor wafer processing system | Patrick Leahey, Jerry Chen, Richard E. Remington, Simon Yavelberg, Timothy D. Driscoll +3 more | 2002-04-09 |
| 5540800 | Inductively coupled high density plasma reactor for plasma assisted materials processing | — | 1996-07-30 |