| 12387978 |
Ru liner above a barrier layer |
Zhaoxuan Wang, Jianxin Lei, Sung-Kwan Kang, Anand Iyer |
2025-08-12 |
| 11908696 |
Methods and devices for subtractive self-alignment |
He Ren, Hao Jiang, Mehul Naik, Jianxin Lei, Chen Gong +1 more |
2024-02-20 |
| 11655534 |
Apparatus for reducing tungsten resistivity |
Jianxin Lei, Jothilingam Ramalingam, Prashanth Kothnur, William Johanson |
2023-05-23 |
| 11637107 |
Silicon-containing layer for bit line resistance reduction |
Tom Ho Wing Yu, Nobuyuki Sasaki, Jianxin Lei, Rongjun Wang, Tza-Jing Gung |
2023-04-25 |
| 11626410 |
Silicon-containing layer for bit line resistance reduction |
Tom Ho Wing Yu, Nobuyuki Sasaki, Jianxin Lei, Rongjun Wang, Tza-Jing Gung |
2023-04-11 |
| 11447857 |
Methods and apparatus for reducing tungsten resistivity |
Jianxin Lei, Jothilingam Ramalingam, Prashanth Kothnur, William Johanson |
2022-09-20 |
| 11257677 |
Methods and devices for subtractive self-alignment |
He Ren, Hao Jiang, Mehul Naik, Jianxin Lei, Chen Gong +1 more |
2022-02-22 |
| 10950500 |
Methods and apparatus for filling a feature disposed in a substrate |
Roey Shaviv, Xikun Wang, Ismail Emesh, Jianxin Lei |
2021-03-16 |
| 10700072 |
Cap layer for bit line resistance reduction |
Priyadarshi Panda, Jianxin Lei, Mihaela Balseanu, Ning Li, Sanjay Natarajan +4 more |
2020-06-30 |
| 10304732 |
Methods and apparatus for filling substrate features with cobalt |
Jianxin Lei, Joung Joo Lee, Rong Tao |
2019-05-28 |
| 8099702 |
Method and apparatus for proximate placement of sequential cells |
Pei-Hsin Ho |
2012-01-17 |
