Issued Patents All Time
Showing 25 most recent of 35 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11651992 | Gap fill void and connection structures | Haigou Huang, Yuping Ren, Guoxiang Ning | 2023-05-16 |
| 10923388 | Gap fill void and connection structures | Haigou Huang, Yuping Ren, Guoxiang Ning | 2021-02-16 |
| 10816483 | Double pass diluted ultraviolet reticle inspection | Jed H. Rankin, Guoxiang Ning, Jung-Yu Hsieh, Ming Lei | 2020-10-27 |
| 10401724 | Pellicle replacement in EUV mask flow | Oktawian Sobieraj, SherJang Singh | 2019-09-03 |
| 10002827 | Method for selective re-routing of selected areas in a target layer and in adjacent interconnecting layers of an IC device | Guoxiang Ning, Yuping Ren, Chin Teong Lim, Xusheng Wu | 2018-06-19 |
| 9864831 | Metrology pattern layout and method of use thereof | Guoxiang Ning, Guido Ueberreiter, Lloyd C. Litt | 2018-01-09 |
| 9817940 | Method wherein test cells and dummy cells are included into a layout of an integrated circuit | Guido Ueberreiter, Guoxiang Ning, Jui-Hsuan Feng, Chin Teong Lim | 2017-11-14 |
| 9817927 | Hard mask etch and dielectric etch aware overlap for via and metal layers | Guo Xiang Ning, Yuping Ren, David N. Power, Lalit Shokeen, Chin Teong Lim +1 more | 2017-11-14 |
| 9798238 | Cross technology reticle (CTR) or multi-layer reticle (MLR) CDU, registration, and overlay techniques | Guo Xiang Ning, Arthur Hotzel, Soon Yoeng Tan | 2017-10-24 |
| 9791772 | Monitoring pattern for devices | Guoxiang Ning, Byoung Il Choi | 2017-10-17 |
| 9672313 | Method for selective re-routing of selected areas in a target layer and in adjacent interconnecting layers of an IC device | Guoxiang Ning, Yuping Ren, Chin Teong Lim, Xusheng Wu | 2017-06-06 |
| 9672312 | Method wherein test cells and dummy cells are included into a layout of an integrated circuit | Guido Ueberreiter, Guoxiang Ning, Jui-Hsuan Feng, Chin Teong Lim | 2017-06-06 |
| 9658531 | Semiconductor device resolution enhancement by etching multiple sides of a mask | Guoxiang Ning, Chunyu WONG, Sarasvathi Thangaraju | 2017-05-23 |
| 9645486 | Multiple threshold convergent OPC model | Chin Teong Lim, Guoxiang Ning | 2017-05-09 |
| 9535319 | Reticle, system comprising a plurality of reticles and method for the formation thereof | Guido Ueberreiter, Guoxiang Ning, Jui-Hsuan Feng, Chin Teong Lim | 2017-01-03 |
| 9500945 | Pattern classification based proximity corrections for reticle fabrication | Guoxiang Ning, Chin Teong Lim, Christian Buergel | 2016-11-22 |
| 9384318 | Mask error compensation by optical modeling calibration | Guoxiang Ning, Chin Teong Lim | 2016-07-05 |
| 9368453 | Overlay mark dependent dummy fill to mitigate gate height variation | Guoxiang Ning, Chan Seob Cho, Jung-Yu Hsieh, Hui Peng Koh | 2016-06-14 |
| 9341961 | Cross technology reticle (CTR) or multi-layer reticle (MLR) CDU, registration, and overlay techniques | Guo Xiang Ning, Arthur Hotzel, Soon Yoeng Tan | 2016-05-17 |
| 9323882 | Metrology pattern layout and method of use thereof | Guoxiang Ning, Guido Ueberreiter, Lloyd C. Litt | 2016-04-26 |
| 9250538 | Efficient optical proximity correction repair flow method and apparatus | Guoxiang Ning, Christopher A. Spence, Chin Teong Lim | 2016-02-02 |
| 9252061 | Overlay mark dependent dummy fill to mitigate gate height variation | Guoxiang Ning, Chan Seob Cho, Jung-Yu Hsieh, Hui Peng Koh | 2016-02-02 |
| 9236301 | Customized alleviation of stresses generated by through-substrate via(S) | Guoxiang Ning, Xiang Hu, Sarasvathi Thangaraju | 2016-01-12 |
| 9136223 | Forming alignment mark and resulting mark | Guoxiang Ning, Soon Yoeng Tan, Seok Yan Poh | 2015-09-15 |
| 9029855 | Layout for reticle and wafer scanning electron microscope registration or overlay measurements | Guo Xiang Ning, Carsten Hartig, Fanghong Gn | 2015-05-12 |