Issued Patents All Time
Showing 1–22 of 22 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12067340 | Computational wafer inspection | Christophe David Fouquet, Bernardo Kastrup, Arie Jeffrey Den Boef, Johannes Catharinus Hubertus Mulkens, James Benedict Kavanagh +1 more | 2024-08-20 |
| 11080459 | Computational wafer inspection | Christophe David Fouquet, Bernardo Kastrup, Arie Jeffrey Den Boef, Johannes Catharinus Hubertus Mulkens, James Benedict Kavanagh +1 more | 2021-08-03 |
| 10579772 | Computational wafer inspection | Christophe David Fouquet, Bernardo Kastrup, Arie Jeffrey Den Boef, Johannes Catharinus Hubertus Mulkens, James Benedict Kavanagh +1 more | 2020-03-03 |
| 9990462 | Computational wafer inspection | Christophe David Fouquet, Bernardo Kastrup, Arie Jeffrey Den Boef, Johannes Catharinus Hubertus Mulkens, James Benedict Kavanagh +1 more | 2018-06-05 |
| 9507907 | Computational wafer inspection | Christophe David Fouquet, Bernardo Kastrup, Arie Jeffrey Den Boef, Johannes Catharinus Hubertus Mulkens, James Benedict Kavanagh +1 more | 2016-11-29 |
| 9188848 | Maskless vortex phase shift optical direct write lithography | Nicholas K. Eib, Ebo Croffie | 2015-11-17 |
| 8377633 | Maskless vortex phase shift optical direct write lithography | Nicholas K. Eib, Ebo Croffie | 2013-02-19 |
| 8057963 | Maskless vortex phase shift optical direct write lithography | Nicholas K. Eib, Ebo Croffie | 2011-11-15 |
| 8015540 | Method and system for reducing inter-layer capacitance in integrated circuits | Kunal N. Taravade, Paul G. Filseth | 2011-09-06 |
| 7738078 | Optimized mirror design for optical direct write | Nicholas K. Eib, Ebo Croffie | 2010-06-15 |
| 7499146 | Lithographic apparatus and device manufacturing method, an integrated circuit, a flat panel display, and a method of compensating for cupping | Kars Zeger Troost, Johannes Jacobus Matheus Baselmans, Arno Jan Bleeker, Louis John Markoya, Nicholas K. Eib | 2009-03-03 |
| 7396760 | Method and system for reducing inter-layer capacitance in integrated circuits | Kunal N. Taravade, Paul G. Filseth | 2008-07-08 |
| 7376260 | Method for post-OPC multi layer overlay quality inspection | Nadya Belova | 2008-05-20 |
| 7372547 | Process and apparatus for achieving single exposure pattern transfer using maskless optical direct write lithography | Nicholas K. Eib, Ebo Croffie | 2008-05-13 |
| 7313508 | Process window compliant corrections of design layout | Ebo Croffie, Colin D. Yates, Nicholas K. Eib, Christopher Neville, Mario Garza | 2007-12-25 |
| 7270942 | Optimized mirror design for optical direct write | Nicholas K. Eib, Ebo Croffie | 2007-09-18 |
| 7189498 | Process and apparatus for generating a strong phase shift optical pattern for use in an optical direct write lithography process | Nicholas K. Eib, Ebo Croffie | 2007-03-13 |
| 7149340 | Mask defect analysis for both horizontal and vertical processing effects | Paul G. Filseth, Kunal N. Taravade, Mario Garza | 2006-12-12 |
| 7005217 | Chromeless phase shift mask | George E. Bailey, John V. Jensen | 2006-02-28 |
| 6864020 | Chromeless phase shift mask using non-linear optical materials | Kunal N. Taravade | 2005-03-08 |
| 6782525 | Wafer process critical dimension, alignment, and registration analysis simulation tool | Mario Garza, George E. Bailey, Travis Brist, Paul G. Filseth | 2004-08-24 |
| 6775818 | Device parameter and gate performance simulation based on wafer image prediction | Kunal N. Taravade, Nadya Strelkova | 2004-08-10 |