Issued Patents All Time
Showing 25 most recent of 33 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10964541 | Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithography | Dario L. Goldfarb | 2021-03-30 |
| 10727055 | Method to increase the lithographic process window of extreme ultra violet negative tone development resists | Nelson Felix, Dario L. Goldfarb | 2020-07-28 |
| 10656523 | Polymer brushes for extreme ultraviolet photolithography | Dario L. Goldfarb, Ankit Vora | 2020-05-19 |
| 10553432 | Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithography | Dario L. Goldfarb | 2020-02-04 |
| 10388521 | Method to increase the lithographic process window of extreme ultra violet negative tone development resists | Nelson Felix, Dario L. Goldfarb | 2019-08-20 |
| 10345702 | Polymer brushes for extreme ultraviolet photolithography | Dario L. Goldfarb, Ankit Vora | 2019-07-09 |
| 10312087 | Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithography | Dario L. Goldfarb | 2019-06-04 |
| 10170301 | Adhesion of polymers on silicon substrates | — | 2019-01-01 |
| 10096477 | Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithography | Dario L. Goldfarb | 2018-10-09 |
| 9671694 | Wet strippable gap fill materials | Ratnam Sooriyakumaran, Seiichiro Tachibana, Hoa D. Truong | 2017-06-06 |
| 9580623 | Patterning process using a boron phosphorus silicon glass film | Seiichiro Tachibana, Yoshinori Taneda, Rie Kikuchi, Tsutomu Ogihara, Yoshio Kawai +1 more | 2017-02-28 |
| 9551696 | Cleanability assessment of sublimate from lithography materials | Mark S. Chace, Margaret C. Lawson, Janine L. Protzman, Qin Yuan | 2017-01-24 |
| 9465290 | Near-infrared absorbing film compositions | Wu-Song Huang, Dario L. Goldfarb, Wai-Kin Li, Sen Liu, Libor Vyklicky | 2016-10-11 |
| 9460934 | Wet strip process for an antireflective coating layer | Wu-Song Huang, Javier Perez, Takeshi Kinsho, Tsutomu Ogihara, Seiichiro Tachibana +1 more | 2016-10-04 |
| 9431250 | Deep well implant using blocking mask | Steven J. Holmes, Daiji Kawamura | 2016-08-30 |
| 9425053 | Block mask litho on high aspect ratio topography with minimal semiconductor material damage | Steven J. Holmes, Daiji Kawamura | 2016-08-23 |
| 9348228 | Acid-strippable silicon-containing antireflective coating | Wu-Song Huang, Ratnam Sooriyakumaran | 2016-05-24 |
| 9337033 | Dielectric tone inversion materials | Wu-Song Huang, Hiroyuki Miyazoe, Ratnam Sooriyakumaran, HsinYu Tsai | 2016-05-10 |
| 9281212 | Dielectric tone inversion materials | Wu-Song Huang, Hiroyuki Miyazoe, Ratnam Sooriyakumaran, HsinYu Tsai | 2016-03-08 |
| 9069245 | Near-infrared absorptive layer-forming composition and multilayer film | Masaki Ohashi, Seiichiro Tachibana, Kazumi Noda, Shozo Shirai, Takeshi Kinsho +3 more | 2015-06-30 |
| 8999625 | Silicon-containing antireflective coatings including non-polymeric silsesquioxanes | Wu-Song Huang, Javier Perez, Ratnam Sooriyakumaran, Takeshi Kinsho, Tsutomu Ogihara +2 more | 2015-04-07 |
| 8816328 | Patterning contacts in carbon nanotube devices | Josephine B. Chang, Michael A. Guillorn | 2014-08-26 |
| 8803129 | Patterning contacts in carbon nanotube devices | Josephine B. Chang, Michael A. Guillorn | 2014-08-12 |
| 8772376 | Near-infrared absorbing film compositions | Wu-Song Huang, Dario L. Goldfarb, Wai-Kin Li, Sen Liu, Libor Vyklicky | 2014-07-08 |
| 8759220 | Patterning process | Tsutomu Ogihara, Takafumi Ueda, Seiichiro Tachibana, Yoshinori Taneda, Margaret C. Lawson +1 more | 2014-06-24 |