| 11735447 |
Enhanced process and hardware architecture to detect and correct realtime product substrates |
Kartik Shah, Wolfgang Aderhold, Martin A. Hilkene, Stephen Moffatt |
2023-08-22 |
| D959490 |
Display screen or portion thereof with graphical user interface |
Kartik Shah, Bindusagar Marath Sankarathodi, Abhilash J. Mayur, Dayal Ramachandran, Amritha Rammohan +2 more |
2022-08-02 |
| 8927400 |
Safe handling of low energy, high dose arsenic, phosphorus, and boron implanted wafers |
Majeed A. Foad, Manoj Vellaikal |
2015-01-06 |
| 8501605 |
Methods and apparatus for conformal doping |
Martin A. Hilkene, Manoj Vellaikal, Mark R. Lee, Matthew D. Scotney-Castle, Peter I. Porshnev |
2013-08-06 |
| 8003500 |
Plasma immersion ion implantation process with chamber seasoning and seasoning layer plasma discharging for wafer dechucking |
Manoj Vellaikal, Yen B. Ta, Martin A. Hilkene, Matthew D. Scotney-Castle, Canfeng Lai +2 more |
2011-08-23 |
| 7989329 |
Removal of surface dopants from a substrate |
Kartik Ramaswamy, Kenneth S. Collins, Biagio Gallo, Hiroji Hanawa, Majeed A. Foad +2 more |
2011-08-02 |
| 7968401 |
Reducing photoresist layer degradation in plasma immersion ion implantation |
Martin A. Hilkene, Yen B. Ta, Peter I. Porshnev, Majeed A. Foad |
2011-06-28 |
| 7723219 |
Plasma immersion ion implantation process with reduced polysilicon gate loss and reduced particle deposition |
Manoj Vallaikal, Peter I. Porshnev, Majeed A. Foad |
2010-05-25 |
| 7659184 |
Plasma immersion ion implantation process with chamber seasoning and seasoning layer plasma discharging for wafer dechucking |
Manoj Vellaikal, Yen B. Ta, Martin A. Hilkene, Matthew D. Scotney-Castle, Canfeng Lai +2 more |
2010-02-09 |
