Issued Patents All Time
Showing 25 most recent of 50 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10248019 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film | Shohei Kataoka, Kana Fujii, Sou Kamimura, Yuichiro Enomoto, Keita Kato +1 more | 2019-04-02 |
| 10126653 | Pattern forming method and resist composition | Shohei Kataoka, Shinji Tarutani, Sou Kamimura, Keita Kato, Yuichiro Enomoto +3 more | 2018-11-13 |
| 9915870 | Pattern forming method, composition kit and resist film, and method for producing electronic device using them, and electronic device | Hiroo Takizawa | 2018-03-13 |
| 9897922 | Method of forming pattern and developer for use in the method | Yuichiro Enomoto, Shinji Tarutani, Sou Kamimura, Keita Kato, Kana Fujii | 2018-02-20 |
| 9760003 | Pattern forming method and actinic-ray- or radiation-sensitive resin composition | Hidenori Takahashi, Shuji Hirano, Sou Kamimura, Keita Kato | 2017-09-12 |
| 9718901 | Resin composition and pattern forming method using the same | Takuya TSURUTA, Tomotaka Tsuchimura | 2017-08-01 |
| 9709892 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same | Shohei Kataoka, Sou Kamimura, Toru Tsuchihashi, Yuichiro Enomoto, Kana Fujii +3 more | 2017-07-18 |
| 9551935 | Pattern forming method and resist composition | Keita Kato, Shinji Tarutani, Toru Tsuchihashi, Sou Kamimura, Yuichiro Enomoto +3 more | 2017-01-24 |
| 9482958 | Method of forming pattern and developer for use in the method | Yuichiro Enomoto, Shinji Tarutani, Sou Kamimura, Keita Kato, Kana Fujii | 2016-11-01 |
| 9454079 | Actinic ray- or radiation-sensitive resin composition, actinic ray- or radiation-sensitive film and method of forming pattern | Akinori Shibuya, Yoko TOKUGAWA, Tomoki Matsuda, Junichi Ito, Shohei Kataoka +4 more | 2016-09-27 |
| 9448482 | Pattern forming method, resist pattern formed by the method, method for manufacturing electronic device using the same, and electronic device | Takanobu Takeda, Hiroo Takizawa | 2016-09-20 |
| 9417528 | Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device | Michihiro SHIRAKAWA, Keita Kato, Tadahiro ODANI, Atsushi Nakamura, Hidenori Takahashi | 2016-08-16 |
| 9411230 | Pattern forming method, electron beam-sensitive or extreme ultraviolet-sensitive composition, resist film, method for manufacturing electronic device using the same, and electronic device | Hiroo Takizawa, Hideaki Tsubaki | 2016-08-09 |
| 9291892 | Actinic ray-sensitive or radiation-sensitive resin composition, and, resist film, pattern forming method, electronic device manufacturing method, and electronic device, each using the composition | Akinori Shibuya | 2016-03-22 |
| 9250532 | Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device | Keita Kato, Michihiro SHIRAKAWA, Tadahiro ODANI, Atsushi Nakamura, Hidenori Takahashi | 2016-02-02 |
| 9223219 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film | Yuichiro Enomoto, Shinji Tarutani, Sou Kamimura, Keita Kato, Akinori Shibuya | 2015-12-29 |
| 9152048 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition | Hiroshi Saegusa, Yusuke Iizuka, Kousuke Koshijima | 2015-10-06 |
| 9140981 | Actinic-ray-sensitive or radiation-sensitive resin composition, and resist film using the same, pattern forming method, electronic device manufacturing method, and electronic device, each using the same | Hidenori Takahashi, Michihiro SHIRAKAWA | 2015-09-22 |
| 9097973 | Method of forming pattern and developer for use in the method | Yuichiro Enomoto, Shinji Tarutani, Sou Kamimura, Keita Kato, Kana Fujii | 2015-08-04 |
| 9086627 | Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, manufacturing method of electronic device, and electronic device | Keita Kato, Michihiro SHIRAKAWA, Tadahiro ODANI, Atsushi Nakamura, Hidenori Takahashi | 2015-07-21 |
| 9075310 | Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device | Michihiro SHIRAKAWA, Keita Kato, Tadahiro ODANI, Atsushi Nakamura, Hidenori Takahashi | 2015-07-07 |
| 9017917 | Resist composition and method of forming pattern therewith | Kazuto Kunita | 2015-04-28 |
| 8999622 | Pattern forming method, chemical amplification resist composition and resist film | Shohei Kataoka | 2015-04-07 |
| 8999621 | Pattern forming method, chemical amplification resist composition and resist film | Yuichiro Enomoto, Sou Kamimura, Shinji Tarutani, Keita Kato | 2015-04-07 |
| 8993211 | Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same | — | 2015-03-31 |